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Three-dimensional microstructure elements fabricated by electron beam lithography and dry etching technique

: Steingrüber, R.; Ferstl, M.


Gentili, M.:
Micro- and nano-engineering 99 : Proceedings of the 25th International Conference on Micro- and Nano-Engineering, September 21 - 23, 1999, Rome, Italy
Amsterdam: Elsevier, 2000 (Microelectronic engineering Vol. 53, 2000.Nr.1-4)
International Conference on Micro- and Nano-Engineering (MNE) <25, 1999, Roma>
Conference Paper, Journal Article
Fraunhofer HHI ()
diffraction gratings; diffractive optical elements; electron beam lithography; micro-optics; microlenses; optical fabrication; sputter etching; three-dimensional microstructure element; dry etching; fabrication; echelette grating; computer generated diffractive optical element; fresnel zone lens

The fabrication of three-dimensional microstructure elements by electron-beam lithography and dry etching technique is shown for the example of typical three-dimensional optical structures (Echelette gratings, computer generated diffractive optical elements and Fresnel zone lenses). Several different structures, mainly for use in micro-optics with feature sizes in the micrometer range and below were realised. The utilisation of electron-beam lithography thereby proved to be extremely flexible and precise.