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  4. Micro-optical elements fabricated by electron-beam lithography and dry etching technique using top conductive coatings
 
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2001
Journal Article
Title

Micro-optical elements fabricated by electron-beam lithography and dry etching technique using top conductive coatings

Abstract
The fabrication of micro-optical elements by electron-beam lithography and dry etching technique using a top conductive coating is presented. This conductive layer prevents the occurrence of charging effects during electron-beam exposure. Several different structures, mainly for use in micro-optics using various resist types, were realised in dielectric substrates. The use of top conductive coatings proved to be practical, reliable and simple.
Author(s)
Steingrüber, R.
Ferstl, M.
Pilz, W.
Journal
Microelectronic engineering  
Conference
International Conference on Micro- and Nano-Engineering 2000  
DOI
10.1016/S0167-9317(01)00497-X
Language
English
Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI  
Fraunhofer-Institut für Siliziumtechnologie ISIT  
Keyword(s)
  • electron beam lithography

  • micro-optics

  • optical fabrication

  • optical films

  • sputter etching

  • micro-optical element

  • fabrication

  • dry etching

  • top conductive coating

  • charging effects

  • dielectric substrate

  • resist

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