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Functional and depth-oriented characterization of technical surfaces

: Westkämper, E.; Kraus, M.

Chiffre, L. de; Carneiro, K. ; Center for Geometrical Metrology, Lyngby; Technical University of Denmark -DTU-, Department of Manufacturing Engineering, Lyngby; Danish Institute for Fundamental Metrology; International Institution for Production Engineering Research -CIRP-, Paris; European Society for Precision Engineering and Nanotechnology -EUSPEN-:
1st EUSPEN Topical Conference on Fabrication and Metrology in Nanotechnolgy 2000. Proceedings
Lyngby, 2000
pp.131-136 (Vol.1)
Conference on Fabrication and Metrology in Nanotechnology <1, 2000, Copenhagen>
Conference Paper
Fraunhofer IPA ()
Nanomeßtechnik; Oberflächenanalyse; Internet-basierte Datenbank; Oberflächeneigenschaften; Messen

Today's Nanometrology is mainly focusing on measurement systems and parameters that only consider the top layer of a surface. But usually characteristics and functional properties of technical surfaces are not only limited to the outermost layer of the surface but depend on different surface regimes. The following article will therefore propose a more meaningful approach to a functional and depth-oriented sample characterization by considering a segmentation of the sample surface into layers of variable depth. A strategy for an optimum choice of measurement and analyzing tools as well as suitable parameters depending on the desired functionality of the sample will be presented and explained by giving a practical example. Core of this strategy is an internet-based database which will cover the metrology data of all measurement tools available for Micro- and Nanometrology.