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New precursors for MOCVD of high-k metal silicates as alternative to SiO2 in semiconducting devices

Poster at Workshop on Nanoscience, October 16-19 2001, Twannberg
 
: Zürcher, S.; Morstein, M.; Bauer, A.J.; Lemberger, M.

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Fulltext urn:nbn:de:0011-n-1200658 (550 KByte PDF)
MD5 Fingerprint: 77aa67f7262169c60c6aaf2cd60a0598
Created on: 11.3.2010


2001, 1 Folie
Workshop on Nanoscience <2001, Twannberg>
English
Poster, Electronic Publication
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-120065.html