Options
Title
Hochreine, nanoskalige, organische Schichtsilikate mit der Struktur des Talks sowie Verfahren zu deren Herstellung
Date Issued
2008
Author(s)
Uebe, J.
Friedrich, H.
Loeschke, P.
Patent No
102008031072
Abstract
Die vorliegende Erfindung betrifft organische Schichtsilikate mit der Struktur und Zusammensetzung des Talks, die als Partikel mit einem durchschnittlichen Durchmesser D(n, 50) von kleiner 1 [mu]m vorliegen, sowie ein Verfahren zu deren Herstellung. Die neuartigen Partikel eignen sich insbesondere zum Einarbeiten in transparente Kunststoffe, deren mechanische und thermische Eigenschaften sie beeinflussen können, ohne die Transparenz negativ zu beeinflussen.
DE 102008031072 A1 UPAB: 20100122 NOVELTY - Particulate, organically modified silicate layer, which excludes magnesium and silicon cation, as a (semi)metal cation, and comprises an organic residue on its surface, is claimed, where the diameter of the particulate is up to 900 nm. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the preparation of the particulate, organically modified silicate layer comprising reacting a silicon organic component comprising one or more trialkoxysilane compound of formula (R1Si(OR2)3) (I) with silicon compound of formula ((R5)3Si(-O-Si(R5)2)n-O-Si(OR2)3) (II) and a magnesium organic component consisting of one or more magnesium alcoholate group of formula (Mg(OR4)2) (III), in an aqueous free solvent; and adding sufficient amount of water, which permits the complete hydrolysis of (III). R1 = alkyl, alkenyl, aryl, arylene, arylalkyl, alkylaryl, alkylarylene, alkenylaryl, arylalkenyl or arylene-alkyl (all optionally substituted by SH, OH, NH2, C(O)OH, C(O)NH2, epoxy, (meth)acryloxy, methacrylamido and/or halo), where the carbon chain and/or -cycle is optionally interrupted by one or more O, S, NH, NR3, C(O), C(O)O, C(S)O, C(O)S, C(O)NH, C(S)NH, C(O)NR3, C(O)NHC(O), NHC(O)NH, -OC(O)O-, OC(O)NH-, SOx, POx, or -N=N, and further comprises -C?=C- or -HC=CH-, preferably optionally substituted phenyl, halogenated, preferably fluorinated 1-4C-alkyl or 1-4C-alkylene; R2 = alkyl optionally interrupted by O, S, NH or NR3; x = 1-4; R5 = alkyl-, alkenyl-, aryl-, arylene-, arylalkyl-, alkylaryl-, alkylarylene-alkenylaryl-, arylalkenyl- or arylenealkyl group (all optionally substituted by SH, OH, NH2, C(O)OH, C(O)NH2, epoxy, (meth)acryloxy, methacrylamido and/or halo), whose carbon chain and/or cycle is optionally interrupted by one or more O, S, NH, NR3, C(O), C(O)O, C(S)O, C(O)S, C(O)NH, C(S)NH, C(O)NR3, C(O)NHC(O) or -N=N and further contains -C?=C- or -HC=CH-group; R3 = optionally substituted alkyl, aryl, alkylaryl or arylalkyl; n = 0-20; and R4 = optionally substituted alkyl-, aryl- or arylalkyl group, whose carbon chain and/or -cycle is optionally interrupted by O, S, NH or NR3. USE - The particulate, organically modified silicate layer is useful as fillers for thermoplastics, preferably transparent plastic. ADVANTAGE - The particulate, organically modified silicate layer exhibits high purity, and provides plastics with high mechanical and thermal properties, without adversely affecting its color and transparency. The particulate, organically modified silicate layer is free of counter ions.
Language
de
Patenprio
DE 102008031072 A: 20080701