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One-step process to deposit a soft super-hydrophobic film by filamentary dielectric barrier discharge-assisted CVD using HMCTSO as a precursor

: Kim, M.C.; Klages, C.-P.


Surface and coatings technology 204 (2009), No.4, pp.428-432
ISSN: 0257-8972
Journal Article
Fraunhofer IST ()
super-hydrophobic; dielectric barrier discharge; double rough structure

In this study, a relatively simple process is used to deposit a soft super-hydrophobic film using hexamethylcyclotrisiloxane as a precursor by dielectric barrier discharge-assisted chemical vapor deposition. The purpose of this study is to introduce a phenomenon of the creation of a double rough structure on a substrate. A maximum contact angle of approximately 162° was obtained and the film grew in the shape of a double roughness structure, similar to a lotus leaf, indicating a super-hydrophobic surface. The results of the aging test indicated that the as-grown super-hydrophobic surface was stable against moisture and was only dependent on the growing structure of films.