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Explosive embossing of holographic structures

 
: Scholz, T.; Seewig, J.; Reithmeier, E.; Helferich, G.

:

Fotakis, C. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Europe, Cardiff:
O3A: Optics for Arts, Architecture, and Archaeology. Proceedings : 20 - 22 June 2007, Munich, Germany
Bellingham, WA: SPIE, 2007 (SPIE Proceedings Series 6618)
ISBN: 978-0-8194-6760-7
Paper 661811
Conference "Optics for Arts, Architecture, and Archaeology" (O3A) <2007, Munich>
English
Conference Paper
Fraunhofer ICT ()

Abstract
A new, fast and easy process for nanostructuring of hard surfaces is currently being developed: explosive embossing. The Institute for measurement and control engineering (IMR) of the Leibniz-Universitt Hannover and the Fraunhofer-Institute for Chemical Technology (ICT) are currently presiding over the project1 which deals with the practicability of explosive embossing for nanostructures such as holographic structures. Within this project the IMR is concerned with the digital creation of holographic data and the numerical simulation and the evaluation of the transfer characteristics of the explosive-embossing-process.

: http://publica.fraunhofer.de/documents/N-118581.html