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XUV interference lithography for sub-10 nm patterning
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2009
Book Article
Titel
XUV interference lithography for sub-10 nm patterning
Author(s)
Danylyuk, S.
Juschkin, L.
Brose, S.
Bergmann, K.
Loosen, P.
Hauptwerk
JARA FIT Jülich-Aachen Research Alliance for Fundamentals of Future Information Technology. Annual Report 2008
Language
English
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Fraunhofer-Institut für Lasertechnik ILT