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Characterization of ultra-thin layers in MOS-devices with XUV reflectometry
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2009
Book Article
Titel
Characterization of ultra-thin layers in MOS-devices with XUV reflectometry
Author(s)
Banyay, M.
Juschkin, L.
Loosen, P.
Roeckerath, M.
Schubert, J.
Hauptwerk
JARA FIT Jülich-Aachen Research Alliance for Fundamentals of Future Information Technology. Annual Report 2008
Language
English
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Fraunhofer-Institut für Lasertechnik ILT