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Deposition of niobium nitride thin films from Tert-Butylamido-Tris-(Diethylamido)-Niobium by a modified industrial MOCVD reactor
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2009
Journal Article
Titel
Deposition of niobium nitride thin films from Tert-Butylamido-Tris-(Diethylamido)-Niobium by a modified industrial MOCVD reactor
Author(s)
Thiede, T.B.
Parala, H.
Reuter, K.
Passing, G.
Kirchmeyer, S.
Hinz, J.
Lemberger, M.
Bauer, A.J.
Barreca, D.
Gasparotto, A.
Fischer, R.A.
Zeitschrift
Chemical vapor deposition: CVD
DOI
10.1002/cvde.200906810
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB