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2009
Conference Paper
Titel
Process control and thin film properties of Al2O3 layers deposited by high power impulse magnetron sputtering
Abstract
A new process control for the reactive high power impulsemagnetron sputtering (HiPIMS) has been developed. It is based on a superposition of bipolar mid-frequency (MF) with low-frequency high power pulses in combination with reactive gas partial pressure control. Alumina (Al2O3) thin films have been deposited on quartz substrates from metallic aluminum targets in an Ar/O2 gas mixture. The films show a smoother surface and a higher refractive index with increasing peak power density.