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Process control and thin film properties of Al2O3 layers deposited by high power impulse magnetron sputtering

 
: Vergöhl, M.; Bruns, S.; Werner, O.

Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 52nd Annual Technical Conference 2009. Proceedings : May 9-14, 2009, Santa Clara, CA USA
Albuquerque: SVC, 2009
ISBN: 978-1-878068-29-3
pp.274-279
Society of Vacuum Coaters (Annual Technical Conference) <52, 2009, Santa Clara/Calif.>
English
Conference Paper
Fraunhofer IST ()

Abstract
A new process control for the reactive high power impulsemagnetron sputtering (HiPIMS) has been developed. It is
based on a superposition of bipolar mid-frequency (MF) with low-frequency high power pulses in combination with reactive gas partial pressure control. Alumina (Al2O3) thin films have been deposited on quartz substrates from metallic aluminum targets in an Ar/O2 gas mixture. The films show a smoother surface and a higher refractive index with increasing peak power density.

: http://publica.fraunhofer.de/documents/N-113287.html