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Comparison of FIB-induced physical and chemical etching

 

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Matsuo, J. ; Institute of Electrical and Electronics Engineers -IEEE-:
Ion implantation technology 98. International Conference on Ion Implantation Technology. Proceedings. Vol.2 : Kyoto, Japan, June 22 - 26, 1998
Piscataway/NJ: IEEE, 1999
ISBN: 0-7803-4538-X
pp.820-823
International Conference on Ion Implantation Technology (IIT) <12, 1998, Kyoto>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-113238.html