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Up-scaling the production of modified a-C:H coatings in the framework of plasma polymerization processes

: Corbella, C.; Bialuch, I.; Kleinschmidt, M.; Bewilogua, K.


Schüler, A. ; European Materials Research Society -EMRS-:
E-MRS spring meeting 2008. Symposium A on Carbon-Based Nanostructured Composite Films. Special issue : 26.05.2008, Strasbourg
Amsterdam: Elsevier, 2009 (Solid state sciences 11.2009, Nr.10)
ISSN: 1293-2558
European Materials Research Society (Spring Meeting) <2008, Strasbourg>
Symposium A on Carbon-Based Nanostructured Composite Films <2008, Strasbourg>
Conference Paper, Journal Article
Fraunhofer IST ()
up-scaling; modified a-C:H; plasma polymerization; PACVD; coating property

Hydrogenated amorphous carbon (a-C:H) films with silicon and oxygen additions, which exhibit mechanical, tribological and wetting properties adequate for protective coating performance, have been synthesized at room temperature in a small- (0.1 m(3)) and a large-scale (1 m(3)) coaters by low-pressure Plasma-Activated Chemical Vapour Deposition (PACVD). Hence, a-C:H:Si and a-C:H:Si:O coatings were produced in atmospheres of tetramethylsilane (TMS) and hexamethyldisiloxane (HMDSO), respectively, excited either by radiofrequency (RF - small scale) or by pulsed-DC power (large scale). Argon was employed as a carrier gas to stabilize the glow discharge. Several series of 2-5 mu m thick coatings have been prepared at different mass deposition rates, R., by varying total gas flow, F, and input power, W. Arrhenius-type plots of R-m/F vs. (WIF)(-1) show linear behaviours for both plasma reactors, as expected for plasma polymerization processes at moderated energies. The calculation of apparent activation energy, E-a, in each series permitted us to define the regimes of energy-deficient and monomer-deficient PACVD processes as a function of the key parameter WIF Moreover, surface properties of the modified aC:H coatings, such as contact angle, abrasive wear rate and hardness, appear also correlated to this parameter. This work shows an efficient methodology to scale up PACVD processes from small, lab-scale plasma machines to industrial plants by the unique evaluation of macroscopic parameters of deposition.