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A comparative study on the photocatalytic and gas sensing properties of pure and N-doped TiO2 thin films

: Delan, A.; Karuppasamy, A.; Schultheiß, E.


Plasma Processes and Polymers 6 (2009), No.S1, pp.S731-S734
ISSN: 1612-8850
ISSN: 1612-8869
International Conference on Plasma Surface Engineering (PSE) <11, 2008, Garmisch-Partenkirchen>
Journal Article, Conference Paper
Fraunhofer FEP ()
gas sensor; magnetron sputtering; oxides L sensors; thin film; UV-irradiation

A correlation between the photocatalytic efficiency and gas sensitivity has been attempted on pure and N-doped TiO2 thin films prepared by pulsed DC magnetron sputtering. The physical properties are studied. The gas sensing behavior in pure and nitrogen doped TiO2 thin films could be realized at low temperature. The measurements start at 130 °C. The nitrogen doped TiO2 (3 sccm) has no sensitivity for oxygen. All sensors have sensitivity to hydrogen. If the temperature is increased the sensitivity is increased. All samples show photocatalytic activity. The photocatalytic and gas sensing properties have no significant correlations.