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Full wafer microlens replication by UV imprint lithography

Poster at the MNE 2009, 35th International Conference on Micro and Nano Engineering, Ghent, Belgium
Replikation von Mikrolinsen mittels UV Imprintithographie auf Waferebene
 
: Schmitt, H.; Rommel, M.; Bauer, A.J.; Frey, L.; Bich, A.; Eisner, M.; Voelkel, R.; Hornung, M.

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Fulltext urn:nbn:de:0011-n-1064892 (3.0 MByte PDF)
MD5 Fingerprint: 873dc9d550ea032d6761a87681203458
Created on: 20.10.2009


2009, 1 Folie
International Conference on Micro and Nano Engineering (MNE 2009) <35, 2009, Ghent>
English
Poster, Electronic Publication
Fraunhofer IISB ()
imprint lithography; microlens imprint lithography; microlens; microlens array; wafer level camera; WLC

Abstract
The fabrication of microlenses is of great interest for several applications in the field of optics like wafer level cameras, homogenization of light, and coupling of light into glass fibers. Especially for low-cost optical products, microlenses have to be fabricated with a high throughput at an adequate quality. One way to fulfil these requirements is the patterning of microlenses by UV imprint lithography (UV-IL). Within this work, microlenses were replicated into the UV curing material PAK-01 by step and stamp UV-IL on silicon substrates with a diameter of 150mm. The resulting substrates were used as masters to cast PDMS templates. These PDMS templates can be used for high throughput full wafer UV-IL. Additionally, quartz substrates with a diameter of 100mm were patterned which could be directly used as so called optowafers. Master and patterned microlenses were inspected by scanning electron microscopy and with a white light profilometer. The results clearly demonstrate the excellent quality of the replication process and the capability of UV-IL to pattern microlenses on full wafer level for high throughput applications.

: http://publica.fraunhofer.de/documents/N-106489.html