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Verfahren zum Erzeugen eines Hohlkatoden-Bogenentladungsplasmas und zum Regeln der Aktivierung von Materialdampfpartikeln, die dem Hohlkatoden-Bogenentladungsplasma ausgesetzt werden

Method for generating hollow cathode arc discharge plasma in a working vacuum chamber and regulating material steam particles exposed to the hollow cathode arc discharge plasma, by reducing gas flow through the hollow cathode
 
: Morgner, H.; Metzner, C.; Klose, L.; Scheffel, B.; Händel, F.; Fietzke, F.; Straach, S.

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DE 102007061418 A: 20071220
DE 102007061418 A: 20071220
H05H0001
H01J0037
C23C0014
C08J0003
German
Patent, Electronic Publication
Fraunhofer FEP ()

Abstract
(A1) Die Erfindung betrifft ein Verfahren zum Erzeugen eines Hohlkathoden-Bogenentladungsplasmas in einer Vakuumarbeitskammer und zum Regeln der Aktivierung von Materialdampfpartikeln (2), die dem Hohlkathoden-Bogenentladungsplasma ausgesetzt werden, wobei eine Anode (7) derart angeordnet wird, dass diese die Hohlkathode (6) zumindest elektronenaustrittsseitig umschliesst und wobei die Hohlkathode (6) von einem mindestens 1 kA/m starken Magnetfeld durchdrungen wird. Dabei wird der Gasfluss durch die Hohlkathode (6) zumindest so weit verringert, bis ein weiteres Verringern des Gasflusses durch die Hohlkathode (6) eine Erhoehung der Ladungstraegerdichte bewirkt. Anschliessend wird der Istwert einer Groesse erfasst, die die Ladungstraegerdichte des Plasmas charakterisiert, und mit einem Sollwert verglichen. Abschliessend wird in Abhaengigkeit vom Vergleichswert die Flussmenge eines Arbeitsgases durch die Hohlkathode (6) in die Vakuumarbeitskammer, die Staerke des die Hohlkathode (6) durchdringenden Magnetfeldes, die Brennspannung oder der Entladungsstrom der Hohlkathoden-Bogenentladung geregelt.

 

DE 102007061418 A1 UPAB: 20090728 NOVELTY - The method comprises reducing gas flow through a hollow cathode (6) until a further reduction of the gas flow through the hollow cathode causes an increase of charge carrier density, detecting the actual value of a size, which characterizes the charge carrier density of a plasma, and determining a reference value from the actual value and desired value. An anode (7) is arranged, so that it encloses the cathode on the side from which the electrons exit. The hollow cathode is penetrated by 1 kA/m of strong magnetic field. The gas flow through the cathode is reduced to less than 20 sccm. DETAILED DESCRIPTION - The method comprises reducing the gas flow through a hollow cathode (6) until a further reduction of the gas flow through the hollow cathode causes an increase of charge carrier density, detecting the actual value of a size, which characterizes the charge carrier density of a plasma, and determining a reference value from the actual value and a desired value. An anode (7) is arranged, so that it encloses the hollow cathode on the side from which the electrons exit. The hollow cathode is penetrated by 1 kA/m of strong magnetic field. The gas flow through the hollow cathode is reduced to less than 20 sccm. The flow quantity of working gases through the hollow cathode into a working vacuum chamber, the strength of the magnetic field penetrating through the hollow cathode, the burning voltage or the discharge current of the hollow cathode arc discharge is regulated in dependent of the reference value. The magnetic field is formed with a strength of 10 kA/m. An inert gas such as argon flows through the hollow cathode. A second gas flow into the vacuum chamber is maintained in addition to the gas flow through the hollow cathode. The argon or a reactive gas such as oxygen is used as a component of the second gas flow. A material is sprayed into the vacuum chamber by a magnetron device and is evaporated in the vacuum chamber. An optical emission signal from the plasma is used as charge carrier density of the plasma of characterized size. The intensity values of two spectral lines are detected as actual value and are set in a ratio to each other, so that the actual value is formed. The spectral line of a gas or a steam particle is used as the spectral lines. A bias voltage of a substrate to be processed is generated by the self-bias of the plasma. The actual value of the product hollow cathode arc discharge current and hollow cathode arc discharge voltage detects for the power, is compared with the desired value and changes the flow of the gas in the vacuum chamber or the strength of the magnetic field in dependent of the comparison results. USE - Method for generating hollow cathode arc discharge plasma in a working vacuum chamber and for regulating material steam particles suspended to the hollow cathode arc discharge plasma. ADVANTAGE - The method is capable of easily and economically generating the hollow cathode arc discharge plasma in the working vacuum chamber with less effort and increasing the plasma density in the working vacuum chamber.

: http://publica.fraunhofer.de/documents/N-106455.html