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Phi-scatterometry for on-line process control

 
: Benesch, N.; Hettwer, A.; Schneider, C.; Pfitzner, L.; Ryssel, H.; Broermann, O.; Marx, E.; Tegeder, V.

AEC/APC Symposium XII 2000. Proceedings. CD-ROM : September 23 - 28, 2000, Lake Tahoe, Nevada
Lake Tahoe, Nev., 2000
Advanced Equipment Control and Advanced Process Control Symposium (AEC/APC) <12, 2000, Lake Tahoe/Nev.>
English
Conference Paper
Fraunhofer IIS B ( IISB) ()

: http://publica.fraunhofer.de/documents/B-90019.html