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Effect of barium contamination on gate oxide integrity in high-k DRAM
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2002
Journal Article
Titel
Effect of barium contamination on gate oxide integrity in high-k DRAM
Author(s)
Boubekeur, H.
Mikolajick, T.
Nagel, N.
Bauer, A.
Frey, L.
Ryssel, H.
Zeitschrift
Journal of non-crystalline solids
DOI
10.1016/S0022-3093(02)00957-2
Language
English
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