Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: A comparison of different concepts

 

Dobisz, E.A. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Emerging Lithographic Technologies IV.
Bellingham: SPIE, 2000 (SPIE Proceedings Series 3997)
ISBN: 0-8194-3615-1
pp.162-168
Emerging Lithographic Technologies Conference <4, 2000, Santa Clara/Calif.>
English
Conference Paper
Fraunhofer ILT ()

Abstract
Extreme ultraviolet (EUV) lithography tools will need a debris free source with a collectable radiation power of about 40 W to fulfill the prerequisites for an economical wafer throughput up to 80 wafer/hour with a wafer size of 300 mm in diameter. Laser produced plasmas and gas discharge based plasmas are under investigation by several working groups as EUV-sources for this purpose. In this paper the achieved results for the different sources are discussed regarding their emission characteristics in comparison to the demands of EUV lithography (EUVL).

: http://publica.fraunhofer.de/documents/B-81501.html