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Exposure of photosensitive glasses with pulsed UV-laser radiation

 
: Brokmann, U.; Jacquorie, M.; Talkenberg, M.; Harnisch, A.; Kreutz, E.W.; Hülsenberg, D.; Poprawe, R.

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Microsystem Technologies 8 (2002), No.2-3, pp.102-104
ISSN: 0946-7076
English
Journal Article
Fraunhofer ILT ()

Abstract
The photosensitivity in UV-range of some glasses can be used for micro structuring. The irradiated areas crystallize after a thermal treatment. Microstructures are achieved by wet-chemical etching of the crystallized areas. Interactions between UV-laser radiation of different wavelength and the photosensitive glass are investigated. The relationship between process parameters and geometry of microstructures is examined.

: http://publica.fraunhofer.de/documents/B-78681.html