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Antireflective and antireflective/antistatic layer systems deposited by Pulse Magnetron Sputtering technology (PMS)
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2001
Conference Paper
Titel
Antireflective and antireflective/antistatic layer systems deposited by Pulse Magnetron Sputtering technology (PMS)
Author(s)
Egel, M.
Winkler, T.
Blüthner, R.
Nyderle, R.
Hauptwerk
6th International Symposium on Sputtering & Plasma Processes 2001. Proceedings
Konferenz
International Symposium on Sputtering & Plasma Processes (ISSP) 2001
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP