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Rod cathode arc-activated deposition (RAD). A new plasma-activated electron beam PVD process
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1999
Journal Article
Titel
Rod cathode arc-activated deposition (RAD). A new plasma-activated electron beam PVD process
Author(s)
Scheffel, B.
Metzner, C.
Goedicke, K.
Heinß, J.-P.
Zywitzki, O.
Zeitschrift
Surface and coatings technology
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP