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ITO films deposited by dual magnetron sputtering (DMS) system using oxide targets

 
: Shin, N.; Kon, M.; Song, P.K.; Shigesato, Y.; Frach, P.; Kojima, H.; Suzuki, K.; Utsumi, K.

Meinema, H.A.:
Advanced coatings on glass & plastics for large-area or high-volume products. Proceedings of the 3rd International Conference on Coatings on Glass 2000
Eindhoven: TNO/TPD, Division Materials Research & Technology, 2000
ISBN: 90-9014255-X
pp.125-128
International Conference on Coatings on Glass (ICCG) <3, 2000, Maastricht>
English
Conference Paper
Fraunhofer FEP ()

Abstract
Sn-doped In2O3 (ITO) films were deposited by dual magnetron sputtering (DMS) system using twin high density ITO oxide targets at substrate temperature (Ts) of RT and 300°C under Ar + O2 gas pressure of 1.0 Pa. No nodules or defects were observed on the target surface after 3000 W, 100 h deposition implying the outstanding micro-arc free and long term process stability. The DMS is considered to have very high potential for the stable, high-power density and high-deposition rate sputtering processes using oxide targets.

: http://publica.fraunhofer.de/documents/B-67403.html