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The influence of pulsed magnetron sputtering on topography and crystallinity of TiO2 films on glass
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2000
Journal Article
Titel
The influence of pulsed magnetron sputtering on topography and crystallinity of TiO2 films on glass
Author(s)
Treichel, O.
Kirchhoff, V.
Zeitschrift
Surface and coatings technology
DOI
10.1016/S0257-8972(99)00522-8
Language
English
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Fraunhofer-Institut fĂĽr Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP