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Single step DUV laser based stripping of photoresist with wafer cleaning for key 0.18 micron processes
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1999
Conference Paper
Title
Single step DUV laser based stripping of photoresist with wafer cleaning for key 0.18 micron processes
Author(s)
Klumpp, A.
Ramm, P.
Mainwork
Semiconductor equipment assessment (SEA): "bridging innovation - productivity gap to the next millenium"
Conference
SEMICON Europa 1999
Language
English
Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM
