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Single step DUV laser based stripping of photoresist with wafer cleaning for key 0.18 micron processes

 
: Klumpp, A.; Ramm, P.

Semiconductor equipment assessment (SEA): "bridging innovation - productivity gap to the next millenium" : April 13, 1999 at SEMICON Europa '99, Munich, Germany. Technical programs for the semiconductor and flat panel display equipment and materials industries
Moutain View, Calif.: SEMI, 1999
SEMICON Europa <1999, München>
English
Conference Paper
Fraunhofer IZM ()

: http://publica.fraunhofer.de/documents/B-63014.html