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Impact of nitrogen implantation into polysilicon to reduce boron penetration through the gate oxide

 
: Bauer, A.J.; Mayer, P.; Frey, L.; Häublein, V.; Ryssel, H.

Matsuo, J.:
Ion implantation technology 98. International Conference on Ion Implantation Technology. Proceedings. Vol.1
Piscataway, NJ: IEEE, 1999
ISBN: 0-7803-4538-X
pp.30-33
International Conference on Ion Implantation Technology (IIT) <12, 1998, Kyoto>
English
Conference Paper
Fraunhofer IIS B ( IISB) ()

: http://publica.fraunhofer.de/documents/B-62397.html