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  4. Impact of nitrogen implantation into polysilicon to reduce boron penetration through the gate oxide
 
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1999
Conference Paper
Title

Impact of nitrogen implantation into polysilicon to reduce boron penetration through the gate oxide

Author(s)
Bauer, A.J.
Mayer, P.
Frey, L.
Häublein, V.
Ryssel, H.
Mainwork
Ion implantation technology 98. International Conference on Ion Implantation Technology. Proceedings. Vol.1  
Conference
International Conference on Ion Implantation Technology (IIT) 1998  
Language
English
IIS-B  
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