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Impact of nitrogen implantation into polysilicon to reduce boron penetration through the gate oxide
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1999
Conference Paper
Titel
Impact of nitrogen implantation into polysilicon to reduce boron penetration through the gate oxide
Author(s)
Bauer, A.J.
Mayer, P.
Frey, L.
Häublein, V.
Ryssel, H.
Hauptwerk
Ion implantation technology 98. International Conference on Ion Implantation Technology. Proceedings. Vol.1
Konferenz
International Conference on Ion Implantation Technology (IIT) 1998
Language
English
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