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16-k infrared micromirror arrays with large-beam deflection and 10-mm pixel size

: Reimer, K.; Engelke, R.; Witt, M.; Wagner, A.

Motamedi, M.E.; Goering, R. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Miniaturized systems with micro-optics and MEMS
Bellingham, Wash.: SPIE, 1999 (SPIE Proceedings Series 3878)
ISBN: 0-8194-3475-2
Conference on Miniaturized Systems with Micro-Optics and MEMS <1999, Santa Clara/Calif.>
Conference Paper
Fraunhofer ISIT ()

Infrared micromirror arrays with large pixel size and large deflection angle have been fabricated and characterized. The paper presents the technology for the realization of micromirror arrays up to 1282 elements, which have both, a pixel size of 100 micrometer X 100 micrometer and a mirror tilting angle of plus or minus 15 degrees. This specification requires an approx. 13 micrometer gap for electrostatic actuation. A metal surface micromachining process has been developed using thick resist UV-lithography, multiple electroplating, a copper sacrificial layer and a CMP process step. Using nonplanar electrodes the driving voltage of electrostatic actuators can be reduced by factors. Using an electrical biasing concept the address voltage could be reduced further. A double layer metalization makes single mirror addressing within the array possible. Applicable switching times and the motion behavior will be discussed using measurement data of a vibrometer.