Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019FCC Physics Opportunities: Future Circular Collider Conceptual Design Report Volume 1
Abada, A.; Abbrescia, M.; AbdusSalam, S.S.; Abdyukhanov, I.; Fernandez, J.A.; Abramov, A.; Aburaia, M.; Acar, A.O.; Adzic, P.R.; Agrawal, P.; Aguilar-Saavedra, J.A.; Aguilera-Verdugo, J.J.; Aiba, M.; Aichinger, I.; Aielli, G.; Akay, A.; Akhundov, A.; Aksakal, H.; Albacete, J.L.; Albergo, S.; Alekou, A.; Aleksa, M.; Aleksan, R.; Fernandez, R.M.A.; Alexahin, Y.; Alia, R.G.; Alioli, S.; Tehrani, N.A.; Allanach, B.C.; Allport, P.P.; Altinli, M.; Altmannshofer, W.; Ambrosio, G.; Amorim, D.; Amstutz, O.; Anderlini, L.; Andreazza, A.; Andreini, M.; Andriatis, A.; Andris, C.; Andronic, A.; Angelucci, M.; Antinori, F.; Antipov, S.A.; Antonelli, M.; Antonello, M.; Antonioli, P.; Antusch, S.; Anulli, F.; Apolinario, L.; Apollinari, G.; Apollonio, A.; Appeloe, D.; Appleby, R.B.; Apyan, A.; Apyan, A.; Arbey, A.; Arbuzov, A.; Arduini, G.; Ari, V.; Arias, S.; Armesto, N.; Arnaldi, R.; Arsenyev, S.A.; Arzeo, M.; Asai, S.; Aslanides, E.; Amann, R.W.; Astapovych, D.; Atanasov, M.; Atieh, S.; Attie, D.; Auchmann, B.;
Zeitschriftenaufsatz
2019HE-LHC: The High-Energy Large Hadron Collider
Abada, A.; Abbrescia, M.; AbdusSalam, S.S.; Abdyukhanov, I.; Abelleira Fernandez, J.; Abramov, A.; Aburaia, M.; Acar, A.O.; Adzic, P.R.; Agrawal, P.; Aguilar-Saavedra, J.A.; Aguilera-Verdugo, J.J.; Aiba, M.; Aichinger, I.; Aielli, G.; Akay, A.; Akhundov, A.; Aksakal, H.; Albacete, J.L.; Albergo, S.; Alekou, A.; Aleksa, M.; Aleksan, R.; Alemany Fernandez, R.M.; Alexahin, Y.; Alía, R.G.; Alioli, S.; Alipour Tehrani, N.; Allanach, B.C.; Allport, P.P.; Altinli, M.; Altmannshofer, W.; Ambrosio, G.; Amorim, D.; Amstutz, O.; Anderlini, L.; Andreazza, A.; Andreini, M.; Andriatis, A.; Andris, C.; Andronic, A.; Angelucci, M.; Antinori, F.; Antipov, S.A.; Antonelli, M.; Antonello, M.; Antonioli, P.; Antusch, S.; Anulli, F.; Apolinario, L.; Apollinari, G.; Apollonio, A.; Appelö, D.; Appleby, R.B.; Apyan, A.; Apyan, A.; Arbey, A.; Arbuzov, A.; Arduini, G.; Ari, V.; Arias, S.; Armesto, N.; Arnaldi, R.; Arsenyev, S.A.; Arzeo, M.; Asai, S.; Aslanides, E.; Aßmann, R.W.; Astapovych, D.; Atanasov, M.; Atieh, S.; Attié
Zeitschriftenaufsatz
2017Silicon-doped hafnium oxide anti-ferroelectric thin films for energy storage
Ali, F.; Liu, X.; Zhou, D.; Yang, X.; Xu, J.; Schenk, T.; Müller, J.; Schroeder, U.; Cao, F.; Dong, X.
Zeitschriftenaufsatz
2015Electric field and temperature scaling of polarization reversal in silicon doped hafnium oxide ferroelectric thin films
Zhou, D.Y.; Guan, Y.; Vopson, M.M.; Xu, J.; Liang, H.L.; Cao, F.; Dong, X.L.; Mueller, J.; Schenk, T.; Schroeder, U.
Zeitschriftenaufsatz
2015The Rayleigh law in silicon doped hafnium oxide ferroelectric thin films
Guan, Yan; Zhou, Dayu; Xu, Jin; Liu, Xiaohua; Cao, Fei; Dong, Xianlin; Müller, Johannes; Schenk, Tony; Schroeder, Uwe
Zeitschriftenaufsatz
2014Ferroelectric and antiferroelectric properties of Si-doped HfO2 thin films
Zhou, D.Y.; Xu, J.; Müller, J.; Schröder, U.
Zeitschriftenaufsatz
2013Wake-up effects in Si-doped hafnium oxide ferroelectric thin films
Zhou, D.Y.; Xu, J.; Li, Q.; Guan, Y.; Cao, F.; Dong, X.L.; Müller, J.; Schenk, T.; Schröder, U.
Zeitschriftenaufsatz
2012Insights into electrical characteristics of silicon doped hafnium oxide ferroelectric thin films
Zhou, Dayu; Müller, J.; Xu, Jin; Knebel, S.; Bräuhaus, D.; Schröder, U.
Zeitschriftenaufsatz
2010Reliability of Al2O3-doped ZrO2 high-k dielectrics in three-dimensional stacked metal-insulator-metal capacitors
Zhou, D.; Schroeder, U.; Xu, J.; Weinreich, W.; Heitmann, J.; Jegert, G.; Kerber, M.; Knebel, S.; Erben, E.; Mikolajick, T.
Zeitschriftenaufsatz
2009Detailed correlation of electrical and breakdown characteristics to the structural properties of ALD grown HfO2- and ZrO2-based capacitor dielectrics
Schroeder, U.; Weinreich, W.; Erben, E.; Mueller, J.; Wilde, L.; Heitmann, J.; Agaiby, R.; Zhou, D.; Jegert, G.; Kersch, A.
Konferenzbeitrag
2009Ferroelectric relaxor behavior and microwave dielectric properties of Ba(Zr0.3Ti0.7)O3 thin films grown by radio frequency magnetron sputtering
Xu, J.; Zhou, D.; Menesklou, W.; Ivers-Tiffee, E.
Zeitschriftenaufsatz
2009Improved manufacturability of ZrO2 MIM capacitors by process stabilizing HfO2 addition
Müller, J.; Böscke, T.S.; Schröder, U.; Reinicke, M.; Oberbeck, L.; Zhou, D.; Weinreich, W.; Kücher, P.; Lemberger, M.; Frey, L.
Konferenzbeitrag, Zeitschriftenaufsatz
2007Realizing the potential of energy efficiency
Jochem, E.; Zhou, D.; Bashmakov, I.; Farinelli, U.; Halpeth, M.K.
Buch