Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2016Catalytic ALD of SiO2 as spacer for an E-Beam direct write self-aligned double patterning process on 300 mm wafers
Kühnel, Kati; Riedel, Stefan; Weinreich, Wenke; Thrun, Xaver; Czernohorsky, Malte; Pätzold, Björn; Rudolph, Matthias
Vortrag
2016Evaluation of water based intelligent fluids for resist stripping in single wafer cleaning tools
Rudolph, Matthias; Esche, Silvio; Hohle, Christoph; Schumann, Dirk; Steinke, Philipp; Thrun, Xaver; Sonntag, Justus von
Konferenzbeitrag
2016Patterning and Imaging with Electrons: Assessing Multi-Beam SEM for e-Beam Structured CMOS Samples
Garbowski, Tomasz; Panteleit, Friedhelm; Dellemann, Gregor; Gutsch, Manuela; Hohle, Christoph; Reich, Elke; Rudolph, Matthias; Steidel, Katja; Thrun, Xaver; Zeidler, Dirk
Konferenzbeitrag
2015Nano patterning at Fraunhofer IPMS-CNT: Fabrication of silicon master for NIL via e-beam direct write
Thrun, Xaver; Choi, Kang-Hoon; Gutsch, Manuela; Hohle, Christoph; Rudolph, Matthias; Seidel, Konrad
Poster
2015Sensitivity analysis for high accuracy proximity effect correction
Thrun, Xaver; Browning, Clyde; Choi, Kang-Hoon; Figueiro, Thiago; Hohle, Christoph; Saib, Mohamed; Schiavone, Patrick; Bartha, Johann W.
Konferenzbeitrag
2015Verification of E-Beam direct write integration into 28nm BEOL SRAM technology
Hohle, Christoph; Choi, Kang-Hoon; Gutsch, Manuela; Hanisch, Norbert; Seidel, Robert; Steidel, Katja; Thrun, Xaver; Werner, Thomas
Konferenzbeitrag
2014Integration of e-beam direct write in BEOL processes of 28nm SRAM technology node using mix and match
Gutsch, Manuela; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Steidel, Katja; Thrun, Xaver; Seidel, Robert; Werner, Thomas
Konferenzbeitrag
2014Introduction of an innovative water based photoresist stripping process using intelligent fluids
Rudolph, Matthias; Felten, Peter; Thrun, Xaver; Schumann, Dirk; Esche, Silvio; Hohle, Christoph
Konferenzbeitrag
2013Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography
Thrun, Xaver; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Steidel, Katja; Guerrero, Douglas; Figueiro, Thiago; Bartha, Johann W.
Konferenzbeitrag
2013Influence of high-energy electron irradiation on ultra-low-k characteristics and transistor performance
Steidel, Katja; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Seidel, Robert; Thrun, Xaver; Werner, Thomas
Konferenzbeitrag
2012Demonstration of 22nm SRAM features with patternable hafnium oxide based resist material using electron-beam lithography
Thrun, Xaver; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Grenville, Andrew; Stowers, Jason K.; Bartha, Johann W.
Konferenzbeitrag
2012Feasibility study of optical/e-beam complementary lithography
Hohle, Christoph; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Rudolph, Matthias; Thrun, Xaver; Jaschinsky, Philipp; Kahlenberg, Frank; Klein, Christof; Klikovits, Jan
Konferenzbeitrag