Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Silicon doped hafnium oxide (HSO) and hafnium zirconium oxide (HZO) based FeFET
Ali, T.; Polakowski, P.; Riedel, S.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Seidel, K.; Löhr, D.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Thrun, X.; Hanisch, N.; Steinke, P.; Calvo, J.; Müller, J.
2016Catalytic ALD of SiO2 as spacer for an E-Beam direct write self-aligned double patterning process on 300 mm wafers
Kühnel, Kati; Riedel, Stefan; Weinreich, Wenke; Thrun, Xaver; Czernohorsky, Malte; Pätzold, Björn; Rudolph, Matthias
2016Evaluation of water based intelligent fluids for resist stripping in single wafer cleaning tools
Rudolph, Matthias; Esche, Silvio; Hohle, Christoph; Schumann, Dirk; Steinke, Philipp; Thrun, Xaver; Sonntag, Justus von
2016Patterning and Imaging with Electrons: Assessing Multi-Beam SEM for e-Beam Structured CMOS Samples
Garbowski, Tomasz; Panteleit, Friedhelm; Dellemann, Gregor; Gutsch, Manuela; Hohle, Christoph; Reich, Elke; Rudolph, Matthias; Steidel, Katja; Thrun, Xaver; Zeidler, Dirk
2015Alternative ULK integration approach using a sacrificial layer in a standard dual damascene flow
Uhlig, B.; Calvo, J.; Koch, J.; Thrun, X.; Liske, R.
2015Nano patterning at Fraunhofer IPMS-CNT: Fabrication of silicon master for NIL via e-beam direct write
Thrun, Xaver; Choi, Kang-Hoon; Gutsch, Manuela; Hohle, Christoph; Rudolph, Matthias; Seidel, Konrad
2015Porous Ultra Low-k Material Integration Through An Extended Dual Damascene Approach: Pre-/ Post-CMP Curing Comparison
Calvo, J.; Koch, J.; Thrun, X.; Seidel, R.; Clauss, E.; Uhlig, B.
2015Sensitivity analysis for high accuracy proximity effect correction
Thrun, Xaver; Browning, Clyde; Choi, Kang-Hoon; Figueiro, Thiago; Hohle, Christoph; Saib, Mohamed; Schiavone, Patrick; Bartha, Johann W.
2015Verification of E-Beam direct write integration into 28nm BEOL SRAM technology
Hohle, Christoph; Choi, Kang-Hoon; Gutsch, Manuela; Hanisch, Norbert; Seidel, Robert; Steidel, Katja; Thrun, Xaver; Werner, Thomas
2014Innovative and water based stripping approach for thick and bulk photoresists
Rudolph, M.; Schumann, D.; Thrun, X.; Esche, S.; Hohle, C.
2014Integration of e-beam direct write in BEOL processes of 28nm SRAM technology node using mix and match
Gutsch, Manuela; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Steidel, Katja; Thrun, Xaver; Seidel, Robert; Werner, Thomas
2014Introduction of an innovative water based photoresist stripping process using intelligent fluids
Rudolph, Matthias; Felten, Peter; Thrun, Xaver; Schumann, Dirk; Esche, Silvio; Hohle, Christoph
201315 days electron beam exposure for manufacturing of large area silicon based NIL master
Thrun, X.; Choi, K.-H.; Freitag, M.; Gutsch, M.; Hohle, C.; Paul, J.; Rudolph, M.; Steidel, K.
2013Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography
Thrun, Xaver; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Steidel, Katja; Guerrero, Douglas; Figueiro, Thiago; Bartha, Johann W.
2013Evaluation of an advanced dual hard mask stack for high resolution pattern transfer
Paul, Jan; Rudolph, M.; Riedel, S.; Thrun, X.; Wege, S.; Hohle, C.
2013High aspect ratio pattern collapse of polymeric UV-nano-imprint molds due to cleaning
Finn, A.; Lu, B.; Kirchner, R.; Thrun, X.; Richter, K.; Fischer, W.-J.
2013High resolution patterning for sub 30 nm technology nodes using a ceramic based dual hard mask
Paul, J.; Rudolph, M.; Riedel, S.; Thrun, X.; Beyer, V.; Wege, S.; Hohle, C.
2013Influence of high-energy electron irradiation on ultra-low-k characteristics and transistor performance
Steidel, Katja; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Seidel, Robert; Thrun, Xaver; Werner, Thomas
2012Demonstration of 22nm SRAM features with patternable hafnium oxide based resist material using electron-beam lithography
Thrun, Xaver; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Grenville, Andrew; Stowers, Jason K.; Bartha, Johann W.
2012Evaluation of direct patternable inorganic spin-on hard mask materials using electron beam lithography
Thrun, X.; Choi, K.H.; Freitag, M.; Grenville, A.; Gutsch, M.; Hohle, C.; Stowers, J.K.; Bartha, J.W.
Konferenzbeitrag, Zeitschriftenaufsatz
2012Feasibility study of optical/e-beam complementary lithography
Hohle, Christoph; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Rudolph, Matthias; Thrun, Xaver; Jaschinsky, Philipp; Kahlenberg, Frank; Klein, Christof; Klikovits, Jan