Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2020Antireflection coating on PMMA substrates by atomic layer deposition
Paul, P.; Pfeiffer, K.; Szeghalmi, A.
Zeitschriftenaufsatz
2020Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: An experimental and computational study
Beladiya, V.; Becker, M.; Faraz, T.; Kessels, W.M.M.; Schenk, P.; Otto, F.; Fritz, T.; Gruenewald, M.; Helbing, C.; Jandt, K.D.; Tünnermann, A.; Sierka, M.; Szeghalmi, A.
Zeitschriftenaufsatz
2020Light scattering characterization of single-layer nanoporous SiO2 antireflection coating in visible light
Sekman, Y.; Felde, N.; Ghazaryan, L.; Szeghalmi, A.; Schröder, S.
Zeitschriftenaufsatz
2019Antireflection coating with consistent near-neutral color on complex-shaped substrates prepared by ALD
Pfeiffer, K.; Dewald, W.; Szeghalmi, A.
Zeitschriftenaufsatz
2019On the Properties of Nanoporous SiO2 Films for Single Layer Antireflection Coating
Ghazaryan, L.; Sekman, Y.; Schröder, S.; Mühlig, C.; Stevanovic, I.; Botha, R.; Aghaee, M.; Creatore, M.; Tünnermann, A.; Szeghalmi, A.
Zeitschriftenaufsatz
2019Optical Coatings with Atomic Precision
Szeghalmi, A.
Zeitschriftenaufsatz
2019Reflexionsminderndes Schichtsystem und Verfahren zu dessen Herstellung
Pfeiffer, Kristin; Schulz, Ulrike; Szeghalmi, Adriana
Patent
2019Wide-Angle Broadband Antireflection Coatings Prepared by Atomic Layer Deposition
Pfeiffer, K.; Ghazaryan, L.; Schulz, U.; Szeghalmi, A.
Zeitschriftenaufsatz
2018Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
Beladiya, V.; Faraz, T.; Kessels, W.M.M.; Tünnermann, A.; Szeghalmi, A.
Konferenzbeitrag
2018Growth of Atomic Layer Deposited Ruthenium and its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygen
Müller, R.; Ghazaryan, L.; Schenk, P.; Wolleb, S.; Beladiya, V.; Otto, F.; Kaiser, N.; Tünnermann, A.; Fritz, T.; Szeghalmi, A.
Zeitschriftenaufsatz
2018Laser-induced damage threshold of nanoporous single-layer ALD antireflective coatings
Gischkat, T.; Botha, R.; Stevanovic, I.; Szeghalmi, A.; Ghazaryan, L.; Bächli, A.
Konferenzbeitrag
2018Leistungsfähigere Entspiegelungen
Schulz, U.; Szeghalmi, A.
Zeitschriftenaufsatz
2018Reproducibility and stability of nanoporous SiO2 thin film coatings
Ghazaryan, L.; Szeghalmi, A.
Konferenzbeitrag
2018Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
Faraz, T.; Knoops, H.C.M.; Verheijen, M.A.; Helvoirt, C.A.A. van; Karwal, S.; Sharma, A.; Beladiya, V.; Szeghalmi, A.; Hausmann, D.M.; Henri, J.; Creatore, M.; Kessels, W.M.M.
Zeitschriftenaufsatz
2017Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
Pfeiffer, K.; Schulz, U.; Tünnermann, A.; Szeghalmi, A.
Zeitschriftenaufsatz
2017High-reflective coatings for ground and space based applications
Schürmann, M.; Schwinde, S.; Jobst, P.J.; Stenzel, O.; Wilbrandt, S.; Szeghalmi, A.; Bingel, A.; Munzert, P.; Kaiser, N.
Konferenzbeitrag
2017Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
Shestaeva, S.; Bingel, A.; Munzert, P.; Ghazaryan, L.; Patzig, C.; Tünnermann, A.; Szeghalmi, A.
Zeitschriftenaufsatz
2017Ta2O5/ Al2O3/ SiO2 - antireflective coating for non-planar optical surfaces by atomic layer deposition
Pfeiffer, K.; Schulz, U.; Tünnermann, A.; Szeghalmi, A.
Konferenzbeitrag
2016Blistering during the atomic layer deposition of iridium
Genevee, P.; Ahiavi, E.; Janunts, N.; Pertsch, T.; Oliva, M.; Kley, E.-B.; Szeghalmi, A.
Zeitschriftenaufsatz
2016Comparative study of ALD SiO2 thin films for optical applications
Pfeiffer, K.; Shestaeva, S.; Bingel, A.; Munzert, P.; Ghazaryan, L.; Helvoirt, C. van; Kessels, W.M.M.; Sanli, U.T.; Grevent, C.; Schütz, G.; Putkonen, M.; Buchanan, I.; Jensen, L.; Ristau, D.; Tünnermann, A.; Szeghalmi, A.
Zeitschriftenaufsatz
2016Encapsulation of optical gratings using nanoporous alumina layers
Ghazaryan, Lilit; Kley, Ernst-Bernhard; Szeghalmi, Adriana
Zeitschriftenaufsatz
2016Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range
Siefke, T.; Kroker, S.; Pfeiffer, K.; Puffky, O.; Dietrich, K.; Franta, D.; Ohlidal, I.; Szeghalmi, A.; Kley, E.-B.; Tünnermann, A.
Zeitschriftenaufsatz
2016Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
Ghazaryan, L.; Kley, E.-B.; Tünnermann, A.; Szeghalmi, A.
Zeitschriftenaufsatz
2016Verfahren zur Herstellung optisch wirksamer Elemente
Szeghalmi, Adriana; Ghazaryan, Lilit; Kley, Ernst Bernhard
Patent
2015Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography
Bourgin, Yannick; Siefke, Thomas; Käsebier, Thomas; Genevee, Pascal; Szeghalmi, Adriana; Kley, Ernst-Bernhard; Zeitner, Uwe D.
Zeitschriftenaufsatz
2015Encapsulation process for diffraction gratings
Ratzsch, Stephan; Kley, Ernst-Bernhard; Tünnermann, Andreas; Szeghalmi, Adriana
Zeitschriftenaufsatz
2015High-efficiency embedded transmission grating made by atomic layer deposition
Ratzsch, S.; Kley, E.-B.; Tünnermann, A.; Szeghalmi, A.
Konferenzbeitrag
2015Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
Ratzsch, Stephan; Kley, Ernst-Bernhard; Tünnermann, Andreas; Szeghalmi, Adriana
Zeitschriftenaufsatz
2015Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
Ratzsch, S.; Kley, E.-B.; Tünnermann, A.; Szeghalmi, A.
Zeitschriftenaufsatz
2015Nanoporous SiO2 made by atomic layer deposition and atomic layer etching
Ghazaryan, L.; Kley, E.-B.; Tünnermann, A.; Szeghalmi, A.
Konferenzbeitrag
2015Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
Pfeiffer, K.; Shestaeva, S.; Bingel, A.; Munzert, P.; Schulz, U.; Kaiser, N.; Tünnermann, A.; Szeghalmi, A.
Konferenzbeitrag
2013Stability and annealing of alucones and alucone alloys
Ghazaryan, Lilit; Kley, Ernst-Bernhard; Tünnermann, Andreas; Szeghalmi, Adriana Viorica
Zeitschriftenaufsatz
2012High aspect ratio deep UV wire grid polarizer fabricated by double patterning
Weber, Thomas; Käsebier, Thomas; Szeghalmi, Adriana; Knez, Mato; Kley, Ernst-Bernhard; Tünnermann, Andreas
Zeitschriftenaufsatz, Konferenzbeitrag
2011Atomic layer deposition of iridium thin films and their application in gold electrodeposition
Szeghalmi, A.; Arnold, M.; Berger, A.; Schammelt, N.; Füchsel, K.; Knez, M.; Kley, E.-B.; Zahn, D.R.T.; Tünnermann, A.
Konferenzbeitrag
2011High aspect ratio iridium wire grid polarizer for UV applications
Weber, T.; Käsebier, T.; Szeghalmi, A.; Knez, M.; Kley, E.B.; Tünnermann, A.
Konferenzbeitrag
2011Iridium wire grid polarizer fabricated using atomic layer deposition
Weber, T.; Kasebier, T.; Szeghalmi, A.; Knez, M.; Kley, E.B.; Tünnermann, A.
Zeitschriftenaufsatz