Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018High-definition nanoimprint stamp fabrication by atomic layer etching
Khan, Sabbir A.; Suyatin, Dmitry B.; Sundqvist, Jonas; Graczyk, Mariusz; Junige, Marcel; Kauppinen, Christoffer; Kvennefors, Anders; Huffman, Maria; Maximov, Ivan
Zeitschriftenaufsatz
2017Atomic layer etching of gallium nitride (0001)
Kauppinen, Christoffer; Khan, Sabbir Ahmed; Sundqvist, Jonas; Suyatin, Dmitry B.; Suihkonen, Sami; Kauppinen, Esko I.; Sopanen, Markku
Zeitschriftenaufsatz
2017Review Article: Recommended reading list of early publications on atomic layer deposition - outcome of the "Virtual Project on the History of ALD"
Ahvenniemi, Esko; Akbashev, Andrew R.; Ali, Saima; Bechelany, Mikhael C.; Berdova, Maria; Boyadjiev, Stefan; Cameron, David; Chen, Rong; Chubarov, Mikhail; Cremers, Véronique; Devi, Anjana; Drozd, V.E.; El’nikova, Liliya; Gottardi, Gloria; Grigoras, Kestutis; Hausmann, Dennis; Hwang, Cheolseong; Jen, Shihhui; Kallio, Tanja; Kanervo, Jaana; Khmelnitskiy, Ivan; Kim, Dohan; Klibanov, Lev; Koshtyal, Yury; Krause, A. Outi; Kuhs, Jakob; Kärkkänen, Irina; Kääriäinen, Marja Leena; Kääriäinen, Tommi; Lamagna, Luca; Łapicki, Adam; Leskelä, Markku; Lipsanen, Harri; Aav, Jussi; Malkov, Anatoly; Malygin, Anatoly; Mennad, Abdelkader; Militzer, Christian; Molarius, Jyrki; Norek, Małgorzata; Ozgit-Akgun, Cagla; Panov, Mikhail; Pedersen, Henrik; Piallat, Fabien; Popov, Georgi; Puurunen, Riikka; Rampelberg, Geert; Ras, Robin; Rauwel, Erwan; Roozeboom, Fred; Sajavaara, Timo; Salami, Hossein; Savin, Hele; Schneider, Nathanaëlle; Seidel, Thomas E.; Sundqvist, Jonas; Suyatin, Dmitry B.; Törndahl, Tobias; Ommen,
Zeitschriftenaufsatz
2016Atomic layer deposition system for fast precursor screening
Shukla, Shashank; Hossbach, Christoph; Sundqvist, Jonas; Bönhardt, Sascha; Feddersen-Clausen, Oliver; Sharma, Varun; Albert, Matthias; Bartha, Johann W.
Poster
2015Fluorine interface treatments within the gate stack for defect passivation in 28 nm high-k metal gate technology
Drescher, M.; Naumann, A.; Sundqvist, J.; Erben, E.; Grass, C.; Trentzsch, M.; Lazarevic, F.; Leitsmann, R.; Plaenitz, P.
Zeitschriftenaufsatz
2015Low temperature deposition of silicon nitride using Si3Cl8
Riedel, S.; Sundqvist, J.; Gumprecht, T.
Zeitschriftenaufsatz
2014ALD ZrO2 processes for BEoL device applications
Weinreich, Wenke; Seidel, Konrad; Polakowski, Patrick; Riedel, Stefan; Wilde, Lutz; Sundqvist, Jonas; Triyoso, Dina H.; Nolan, Mark G.
Konferenzbeitrag
2014Ferroelectric deep trench capacitors based on Al:HfO2 for 3D nonvolatile memory applications
Polakowski, Patrick; Riedel, Stefan; Weinreich, Wenke; Rudolf, M.; Sundqvist, Jonas; Seidel, Konrad; Müller, Johannes
Konferenzbeitrag
2014Origin of the endurance degradation in the novel HfO2-based 1T ferroelectric non-volatile memories
Yurchuk, E.; Mueller, S.; Martin, D.; Slesazeck, S.; Schroeder, U.; Mikolajick, T.; Müller, J.; Paul, J.; Hoffmann, R.; Sundqvist, J.; Schlösser, T.; Boschke, R.; Bentum, R. van; Trentzsch, M.
Konferenzbeitrag
2014Role of the dielectric for the charging dynamics of the dielectric/barrier interface in AlGaN/GaN based metal-insulator-semiconductor structures under forward gate bias stress
Lagger, Peter; Steinschifter, P.; Reiner, M.; Stadtmüller, M.; Denifl, G.; Naumann, Andreas; Müller, Johannes; Wilde, Lutz; Sundqvist, Jonas; Pogany, D.
Zeitschriftenaufsatz
2013Detailed leakage current analysis of metal-insulator-metal capacitors with ZrO2, ZrO2/SiO2/ZrO2, and ZrO2/Al2O3/ZrO2 as dielectric and TiN electrodes
Weinreich, W.; Shariq, A.; Seidel, K.; Sundqvist, J.; Paskaleva, A.; Lemberger, M.; Bauer, A.J.
Zeitschriftenaufsatz, Konferenzbeitrag
2013High-density capacitors for SiP and SoC applications based on three-dimensional integrated metal-isolator-metal structures
Weinreich, Wenke; Rudolph, Matthias; Koch, Johannes; Paul, Jan; Seidel, Konrad; Riedel, Stefan; Sundqvist, Jonas
Konferenzbeitrag
2013Impact of layer thickness on the ferroelectric behaviour of silicon doped hafnium oxide thin films
Yurchuk, E.; Müller, J.; Knebel, S.; Sundqvist, J.; Graham, A.P.; Melde, T.; Schröder, U.; Mikolajick, T.
Konferenzbeitrag, Zeitschriftenaufsatz
2013Scaling and optimization of high-density integrated Si-capacitors
Weinreich, W.; Seidel, K.; Rudolph, M.; Koch, J.; Paul, J.; Riedel, S.; Sundqvist, J.; Steidel, K.; Gutsch, M.; Beyer, V.; Hohle, C.
Konferenzbeitrag
2013Structural properties of as deposited and annealed ZrO2 influenced by atomic layer deposition, substrate, and doping
Weinreich, W.; Wilde, L.; Müller, J.; Sundqvist, J.; Erben, E.; Heitmann, J.; Lemberger, M.; Bauer, A.J.
Zeitschriftenaufsatz
2013TEMAZ/O-3 atomic layer deposition process with doubled growth rate and optimized interface properties in metal-insulator-metal capacitors
Weinreich, W.; Tauchnitz, T.; Polakowski, P.; Drescher, M.; Riedel, S.; Sundqvist, J.; Seidel, K.; Shirazi, M.; Elliott, S.D.; Ohsiek, S.; Erben, E.; Trui, B.
Zeitschriftenaufsatz
2012Aluminium-, Titan- und Silizium-basierte Oxidschichten für verschiedene Anwendungen mittels ALD
Krug, M.; Endler, I.; Benner, F.; Dirnstorfer, I.; Müller, J.; Sundqvist, J.; Rose, M.; Jakschik, S.; Weber, J.; Liepack, H.
Konferenzbeitrag
2012Effect of different PDAs and a PMA on the electrical performance of TiN/ZAZ/TiN MIM capacitors
Weinreich, W.; Seidel, K.; Sundqvist, J.; Czernohorsky, M.; Kucher, P.
Konferenzbeitrag
2012Ferroelectricity in HfO 2 enables nonvolatile data storage in 28 nm HKMG
Müller, J.; Yurchuk, E.; Schlösser, T.; Paul, J.; Hoffmann, R.; Müller, S.; Martin, D.; Slesazeck, S.; Polakowski, P.; Sundqvist, J.; Czernohorsky, M.; Seidel, K.; Kücher, P.; Boschke, R.; Trentzsch, M.; Gebauer, K.; Schröder, U.; Mikolajick, T.
Konferenzbeitrag
2012Incipient ferroelectricity in Al-doped HfO2 thin films
Mueller, Stefan; Mueller, Johannes; Singh, Aarti; Riedel, Stefan; Sundqvist, Jonas; Schroeder, Uwe; Mikolajick, Thomas
Zeitschriftenaufsatz
2012Introduction of zirconium oxide in a hardmask concept for highly selective patterning of scaled high aspect ratio trenches in silicon
Paul, Jan; Riedel, Stefan; Rudolph, Matthias; Wege, Stephan; Czernohorsky, Malte; Sundqvist, Jonas; Hohle, Christoph; Beyer, Volkhard
Zeitschriftenaufsatz, Konferenzbeitrag
2011Atomic layer deposition of ruthenium films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and oxygen
Kukli, K.; Kemeli, M.; Puukilainen, E.; Aarik, J.; Aidla, A.; Sjavaara, T.; Laitinen, M.; Tallarida, M.; Sundqvist, J.; Ritala, M.; Leskela, M.
Zeitschriftenaufsatz
2011Atomic layer deposition of ruthenium films on strontium titanate
Kukli, K.; Kemell, M.; Lu, J.; Hultman, L.; Riedel, S.; Sundqvist, J.; Ritala, M.; Leskela, M.
Zeitschriftenaufsatz
2011Ferroelectric Zr0.5Hf0.5O2 thin films for nonvolatile memory applications
Müller, J.; Böscke, T.S.; Bräuhaus, D.; Schröder, U.; Böttger, U.; Sundqvist, J.; Kcher, P.; Mikolajick, T.; Frey, L.
Zeitschriftenaufsatz
2011Ferroelectricity in yttrium-doped hafnium oxide
Müller, J.; Schröder, U.; Böscke, T.S.; Müller, I.; Böttger, U.; Wilde, L.; Sundqvist, J.; Lemberger, M.; Kücher, P.; Mikolajick, T.; Frey, L.
Zeitschriftenaufsatz
2011SiGe epitaxy on a 300 mm batch furnace
Naumann, A.; Sundqvist, J.; Ogiewa, M.; Boitier, L.; Czernohorsky, M.; Sienz, S.; Probst, G.; Jongbloed, B.; Beulens, S.; Maes, J.W.; Thomas, S.
Zeitschriftenaufsatz
2011Synthesis of SrTiO3 by crystallization of SrO/TiO2 superlattices prepared by atomic layer deposition
Riedel, Stefan; Neidhardt, J.; Jansen, S.; Wilde, Lutz; Sundqvist, Jonas; Erben, E.; Teichert, S.; Michaelis, A.
Zeitschriftenaufsatz
2010Thermal ALD of SrTiO3 films using Sr(iPr3Cp)2 and Star-Ti
Riedel, S.; Sundqvist, J.; Wilde, L.; Boitier, L.; Wilde, C.; Blasco, N.; Lachaud, C.; Zauner, A.; Michaelis, A.
Poster
2009Atomic layer deposition of high-permittivity yttrium-doped HfO2 films
Niinistö, J; Kukli, K.; Sajavaara, T.; Ritala, M.; Leskela, M.; Oberbeck, L.; Sundqvist, J.; Schröder, U.
Zeitschriftenaufsatz