Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Aspects of high aspect ratio silicon etching - capacitor application
Rudolph, Matthias; Pätzold, Björn; Czernohorsky, Malte
Vortrag
2016Catalytic ALD of SiO2 as spacer for an E-Beam direct write self-aligned double patterning process on 300 mm wafers
Kühnel, Kati; Riedel, Stefan; Weinreich, Wenke; Thrun, Xaver; Czernohorsky, Malte; Pätzold, Björn; Rudolph, Matthias
Vortrag
2016Evaluation of water based intelligent fluids for resist stripping in single wafer cleaning tools
Rudolph, Matthias; Esche, Silvio; Hohle, Christoph; Schumann, Dirk; Steinke, Philipp; Thrun, Xaver; Sonntag, Justus von
Konferenzbeitrag
2016Patterning and Imaging with Electrons: Assessing Multi-Beam SEM for e-Beam Structured CMOS Samples
Garbowski, Tomasz; Panteleit, Friedhelm; Dellemann, Gregor; Gutsch, Manuela; Hohle, Christoph; Reich, Elke; Rudolph, Matthias; Steidel, Katja; Thrun, Xaver; Zeidler, Dirk
Konferenzbeitrag
2016Reaktives Ionenätzen zur Mehrfachstrukturierung und Elektrodentrennung für Kondensatoranwendungen in der Halbleiterindustrie
Pätzold, Björn
: Hohle, Christoph; Rudolph, Matthias; Rennekamp, Reinhold
Master Thesis
2015Nano patterning at Fraunhofer IPMS-CNT: Fabrication of silicon master for NIL via e-beam direct write
Thrun, Xaver; Choi, Kang-Hoon; Gutsch, Manuela; Hohle, Christoph; Rudolph, Matthias; Seidel, Konrad
Poster
2014Introduction of an innovative water based photoresist stripping process using intelligent fluids
Rudolph, Matthias; Felten, Peter; Thrun, Xaver; Schumann, Dirk; Esche, Silvio; Hohle, Christoph
Konferenzbeitrag
2013High-density capacitors for SiP and SoC applications based on three-dimensional integrated metal-isolator-metal structures
Weinreich, Wenke; Rudolph, Matthias; Koch, Johannes; Paul, Jan; Seidel, Konrad; Riedel, Stefan; Sundqvist, Jonas
Konferenzbeitrag
2012Feasibility study of optical/e-beam complementary lithography
Hohle, Christoph; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Rudolph, Matthias; Thrun, Xaver; Jaschinsky, Philipp; Kahlenberg, Frank; Klein, Christof; Klikovits, Jan
Konferenzbeitrag
2012Introduction of zirconium oxide in a hardmask concept for highly selective patterning of scaled high aspect ratio trenches in silicon
Paul, Jan; Riedel, Stefan; Rudolph, Matthias; Wege, Stephan; Czernohorsky, Malte; Sundqvist, Jonas; Hohle, Christoph; Beyer, Volkhard
Zeitschriftenaufsatz, Konferenzbeitrag