Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019Crystallisation phenomena of In₂O₃:H films
Muydinov, R.; Steigert, A.; Wollgarten, M.; Michalowski, P.; Bloeck, U.; Pflug, A.; Erfurt, D.; Klenk, R.; Körner, S.; Lauermann, I.; Szyszka, B.
Zeitschriftenaufsatz
2017Entwicklung von Spinell-Dünnschicht-Kathoden für Lithium-Ionen-Batterien und deren Charakterisierung mittels Lock-In-Thermografie
Michalowski, Peter
: Parisi, Jürgen; Busse, Matthias
Dissertation
2017Examining inhomogeneous degradation of graphite/carbon black composite electrodes in Li-ion batteries by lock-in thermography
Michalowski, Peter; Gräfenstein, Alexander; Knipper, Martin; Plaggenborg, Thorsten; Schwenzel, Julian; Parisi, Jürgen
Zeitschriftenaufsatz
2011Conductivity and charge trapping after electrical stress in amorphous and polycrystalline Al2O3-based devices studied with AFM-related techniques
Lanza, M.; Porti, M.; Nafria, M.; Aymerich, X.; Benstetter, G.; Lodermeier, E.; Ranzinger, H.; Jaschke, G.; Teichert, S.; Wilde, L.; Michalowski, P.P.
Zeitschriftenaufsatz
2010Formation of an interface layer between Al1-xSixOy thin films and the Si substrate during rapid thermal annealing
Michalowski, Pawel Piotr; Beyer, Volkhard; Czernohorsky, Malte; Kücher, P.; Teichert, Steffen; Jaschke, Gert; Möller, Wolfhard
Zeitschriftenaufsatz
2010Improved high-temperature etch processing of high-k metal gate stacks in scaled TANOS memory devices
Paul, Jan; Beyer, Volkhard; Czernohorsky, Malte; Beug, M. Florian; Biedermann, Kati; Mildner, Marcus; Michalowski, Pawel Piotr; Schütze, Enrico; Melde, Thomas; Wege, S.; Knöfler, Roman; Mikolajick, Thomas
Konferenzbeitrag
2009Atomic layer deposition of titanium dioxide thin films from Cp*Ti(OMe)3 and ozone
Rose, M.; Niinistö, J; Michalowski, P.; Gerlich, L.; Wilde, L.; Endler, I.; Bartha, J.W.
Zeitschriftenaufsatz
2009Characterization of the diffusium process in Al2O3 thin films based on ToF-SIMS measurements
Michalowski, Pawel Piotr; Czernohorsky, Malte; Beyer, Volkhard; Jaschke, Gert; Teichert, Steffen
Zeitschriftenaufsatz
2009Crystallization and silicon diffusion nanoscale effects on the electrical properties of Al2O3 based devices
Lanza, M.; Porti, M.; Nafria, M.; Aymerich, X.; Benstetter, G.; Lodermeier, E.; Ranzinger, H.; Jaschke, G.; Teichert, S.; Wilde, L.; Michalowski, P.
Konferenzbeitrag
2009TaN metal gate damage during high-k (Al2O3) high-temperature etch
Paul, Jan; Beyer, Volkhard; Michalowski, Pawel Piotr; Beug, M. Florian; Bach, Lars; Ackermann, Marco; Wege, S.; Tilke, Armin T.; Chan, N.; Mikolajick, Thomas; Bewersdorff-Sarlette, Ulrike; Knöfler, Roman; Czernohorsky, Malte; Ludwig, C.
Konferenzbeitrag