Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2021A Fully Integrated Ferroelectric Thin-Film-Transistor - Influence of Device Scaling on Threshold Voltage Compensation in Displays
Lehninger, D.; Ellinger, M.; Ali, T.; Li, S.; Mertens, K.; Lederer, M.; Olivio, R.; Kampfe, T.; Hanisch, N.; Biedermann, K.; Rudolph, M.; Brackmann, V.; Sanctis, C.; Jank, M.; Seidel, K.
Zeitschriftenaufsatz
2021Impact of the Nonlinear Dielectric Hysteresis Properties of a Charge Trap Layer in a Novel Hybrid High-Speed and Low-Power Ferroelectric or Antiferroelectric HSO/HZO Boosted Charge Trap Memory
Ali, T.; Mertens, K.; Olivo, R.; Rudolph, M.; Oehler, S.; Kuhnel, K.; Lehninger, D.; Muller, F.; Hoffmann, R.; Schramm, P.; Biedermann, K.; Metzger, J.; Binder, R.; Czernohorsky, M.; Kampfe, T.; Muller, J.; Seidel, K.; Houdt, J. Van; Eng, L.M.
Zeitschriftenaufsatz
2021Impact of the SiO2 interface layer on the crystallographic texture of ferroelectric hafnium oxide
Lederer, M.; Reck, A.; Mertens, K.; Olivo, R.; Bagul, P.; Kia, A.; Volkmann, B.; Kämpfe, T.; Seidel, K.; Eng, L.M.
Zeitschriftenaufsatz
2021RF-Characterization of HZO Thin Film Varactors
Abdulazhanov, S.; Le, Q.H.; Huynh, D.K.; Wang, D.; Lederer, M.; Olivo, R.; Mertens, K.; Emara, J.; Kämpfe, T.; Gerlach, G.
Zeitschriftenaufsatz
2020Effect of Substrate Implant Tuning on the Performance of MFIS Silicon Doped Hafnium Oxide (HSO) FeFET Memory
Ali, T.; Kühnel, K.; Mertens, K.; Czernohorsky, M.; Rudolph, M.; Duhan, P.; Lehninger, D.; Hoffmann, R.; Steinke, P.; Müller, J.; Houdt, J. van; Seidel, K.; Eng, L.M.
Konferenzbeitrag
2020Furnace annealed HfO2-Films for the Integration of Ferroelectric Functionalities into the BEoL
Lehninger, D.; Ali, T.; Olivo, R.; Lederer, M.; Kämpfe, T.; Mertens, K.; Seidel, K.
Konferenzbeitrag
2020Impact of Ferroelectric Wakeup on Reliability of Laminate based Si-doped Hafnium Oxide (HSO) FeFET Memory Cells
Ali, T.; Kühnel, K.; Czernohorsky, M.; Rudolph, M.; Pätzold, B.; Olivo, R.; Lehninger, D.; Mertens, K.; Müller, F.; Lederer, M.; Hoffmann, R.; Mart, C.; Kalkani, M.N.; Steinke, P.; Kämpfe, T.; Müller, J.; Houdt, J. van; Seidel, K.; Eng, L.M.
Konferenzbeitrag
2020Integration of Hafnium Oxide on Epitaxial SiGe for p-type Ferroelectric FET Application
Lederer, M.; Müller, F.; Kühnel, K.; Olivo, R.; Mertens, K.; Trentzsch, M.; Dünkel, S.; Müller, J.; Beyer, S.; Seidel, K.; Kämpfe, T.; Eng, L.M.
Zeitschriftenaufsatz
2020A Novel Dual Ferroelectric Layer Based MFMFIS FeFET with Optimal Stack Tuning Toward Low Power and High-Speed NVM for Neuromorphic Applications
Ali, T.; Seidel, K.; Kühnel, K.; Rudolph, M.; Czernohorsky, M.; Mertens, K.; Hoffmann, R.; Zimmermann, K.; Mühle, U.; Müller, J.; Houdt, J. van; Eng, L.M.
Konferenzbeitrag
2020A novel hybrid high-speed and low power antiferroelectric HSO boosted charge trap memory for high-density storage
Ali, T.; Mertens, K.; Olivo, R.; Rudolph, M.; Oehler, S.; Kühnel, K.; Lehninger, D.; Müller, F.; Lederer, M.; Hoffmann, R.; Schramm, P.; Biedermann, K.; Kia, A.M.; Metzger, J.; Binder, R.; Czernohorsky, M.; Kämpfe, T.; Müller, J.; Seidel, K.; Houdt, J.V. van; Eng, L.M.
Konferenzbeitrag