Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019Studying dopant diffusion from Poly-Si passivating contacts
Feldmann, F.; Schön, J.; Niess, J.; Lerch, W.; Hermle, M.
Zeitschriftenaufsatz
2017High-K metal gate stacks with ultra-thin interfacial layers formed by low temperature microwave-based plasma oxidation
Czernohorsky, M.; Seidel, K.; Kühnel, K.; Niess, J.; Sacher, N.; Kegel, W.; Lerch, W.
Zeitschriftenaufsatz
2016Low-temperature microwave-based plasma oxidation of Ge and oxidation of silicon followed by plasma nitridation
Lerch, W.; Schick, T.; Sacher, N.; Kegel, W.; Niess, J.; Czernohorsky, M.; Riedel, S.
Konferenzbeitrag
2012Precipitation of antimony implanted into silicon
Koffel, S.; Pichler, P.; Reading, M.A.; Berg, J. van den; Kheyrandish, H.; Hamm, S.; Lerch, W.; Pakfar, A.; Tavernier, C.
Zeitschriftenaufsatz, Konferenzbeitrag
2011An X-ray photoelectron spectroscopy study of ultra-thin oxynitride films
Ladas, S.; Sygellou, L.; Kennou, S.; Wolf, M.; Roeder, G.; Nutsch, A.; Rambach, M.; Lerch, W.
Zeitschriftenaufsatz
2008Advanced activation trends for boron and arsenic by combinations of single, multiple flash anneals and spike rapid thermal annealing
Lerch, W.; Paul, S.; Niess, J.; McCoy, S.; Gelpey, J.; Cristiano, F.; Severac, F.; Fazzini, P.; Martinez-Limia, A.; Pichler, P.; Kheyrandish, H.; Bolze, D.
Konferenzbeitrag, Zeitschriftenaufsatz
2008Distribution and segregation of arsenic at the SiO2/Si interface
Steen, C.; Martinez-Limia, A.; Pichler, P.; Ryssel, H.; Paul, S.; Lerch, W.; Pei, L.; Duscher, G.; Severac, F.; Cristiano, F.; Windl, W.
Zeitschriftenaufsatz
2008Experimental investigations and simulation of the deactivation of arsenic during thermal processes after activation by SPER and spike annealing
Martinez-Limia, A.; Pichler, P.; Lerch, W.; Paul, S.; Kheyrandish, H.; Pakfar, A.; Tavernier, C.
Zeitschriftenaufsatz
2008Modeling and simulation of advanced annealing processes
Martinez-Limia, A.; Pichler, P.; Steen, C.; Paul, S.; Lerch, W.
Aufsatz in Buch
2008Modeling of the diffusion and activation of arsenic in silicon including clustering and precipitation
Martinez-Limia, A.; Pichler, P.; Steen, C.; Paul, S.; Lerch, W.
Konferenzbeitrag
2008On a computationally efficient approach to boron-interstitial clustering
Schermer, J.; Martinez-Limia, A.; Pichler, P.; Zechner, C.; Lerch, W.; Paul, S.
Zeitschriftenaufsatz, Konferenzbeitrag
2008Process models for advanced annealing schemes and their use in device simulation
Pichler, P.; Martinez-Limia, A.; Kampen, C.; Burenkov, A.; Schermer, J.; Paul, S.; Lerch, W.; Gelpey, J.; McCoy, S.; Kheyrandish, H.; Pakfar, A.; Tavernier, C.; Bolze, D.
Konferenzbeitrag
2007Advanced activation and deactivation of arsenic-implanted ultra-shallow junctions using flash and spike + flash annealing
Lerch, W.; Paul, S.; Niess, J.; McCoy, S.; Gelpey, J.; Bolze, D.; Cristiano, F.; Severac, F.; Fazzini, P.F.; Martinez, A.; Pichler, P.
Konferenzbeitrag
2007Diffusion and deactivation of As in Si: Combining atomistic and continuum simulation approaches
Martinez-Limia, A.; Steen, C.; Pichler, P.; Gupta, N.; Windl, W.; Paul, S.; Lerch, W.
Konferenzbeitrag
2007Experimental and theoretical results of dopant activation by a combination of spike and flash annealing
Lerch, W.; Paul, S.; Niess, J.; Chan, J.; McCoy, S.; Gelpey, J.; Cristiano, F.; Severac, F.; Fazzini, P.F.; Bolze, D.; Pichler, P.; Martinez, A.; Mineji, A.; Shishiguchi, S.
Konferenzbeitrag
2007On a computationally efficient approach to Boron-interstitial clustering
Schermer, J.; Pichler, P.; Zechner, C.; Lerch, W.; Paul, S.
Konferenzbeitrag
2006Diffusion and activation of dopants in silicon and advanced silicon-based materials
Pichler, P.; Ortiz, C.J.; Colombeau, B.; Cowern, N.E.B.; Lampin, E.; Uppal, S.; Karunaratne, M.S.A.; Bonar, J.M.; Willoughby, A.F.W.; Claverie, A.; Cristiano, F.; Lerch, W.; Paul, S.
Zeitschriftenaufsatz
2006Flash Annealing Technology for USJ: Modeling and Metrology
Gelpey, J.; McCoy, S.; Camm, D.; Lerch, W.; Paul, S.; Pichler, P.; Borland, J.O.; Timans, P.
Konferenzbeitrag
2006Pattern Effects with the Mask Off
Nenyei, Z.; Niess, J.; Lerch, W.; Dietl, W.; Timans, P.J.; Pichler, P.
Konferenzbeitrag
2006Process-induced diffusion phenomena in advanced CMOS technologies
Pichler, P.; Burenkov, A.; Lerch, W.; Lorenz, J.; Paul, S.; Niess, J.; Nényei, Z.; Gelpey, J.; McCoy, S.; Windl, W.; Giles, L.F.
Konferenzbeitrag
2005Advanced activation of ultra-shallow junctions using flash-assisted RTP
Lerch, W.; Paul, S.; Niess, J.; McCoy, S.; Selinger, T.; Gelpey, J.; Cristiano, F.; Severac, F.; Gavelle, M.; Boninelli, S.; Pichler, P.; Bolze, D.
Konferenzbeitrag, Zeitschriftenaufsatz
2004Boron-interstitial cluster kinetics: Extraction of binding energies from dedicated experiments
Ortiz, C.J.; Pichler, P.; Haublein, V.; Mannino, G.; Scalese, S.; Privitera, V.; Solmi, S.; Lerch, W.
Konferenzbeitrag
2004Electrical deactivation and diffusion of boron in preamorphized ultrashallow junctions: Interstitial transport and F co-implant control
Colombeau, B.; Smith, A.J.; Cowern, N.E.B.; Lerch, W.; Paul, S.; Pawlak, B.J.; Cristiano, F.; Hebras, X.; Bolze, D.; Ortiz, C.; Pichler, P.
Konferenzbeitrag
2004On the modeling of transient diffusion and activation of boron during post-implantation annealing
Pichler, P.; Ortiz, C.J.; Colombeau, B.; Cowern, N.E.B.; Lampin, E.; Claverie, A.; Cristiano, F.; Lerch, W.; Paul, S.
Konferenzbeitrag