Fraunhofer-Gesellschaft

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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2021The effect of temperature on the ferroelectric properties of Hafnium Zirconium Oxide MFM thin-film varactors
Abdulazhanov, S.; Lederer, M.; Lehninger, D.; Ali, T.; Olivo, R.; Kämpfe, T.
Konferenzbeitrag
2021A FeFET with a novel MFMFIS gate stack: Towards energy-efficient and ultrafast NVMs for neuromorphic computing
Ali, T.; Mertens, K.; Kühnel, K.; Rudolph, M.; Oehler, S.; Lehninger, D.; Müller, F.; Revello, R.; Hoffmann, R.; Zimmermann, K.; Kämpfe, T.; Czernohorsky, M.; Seidel, K.; Houdt, J. van; Eng, L.M.
Zeitschriftenaufsatz
2021A Fully Integrated Ferroelectric Thin-Film-Transistor - Influence of Device Scaling on Threshold Voltage Compensation in Displays
Lehninger, D.; Ellinger, M.; Ali, T.; Li, S.; Mertens, K.; Lederer, M.; Olivio, R.; Kampfe, T.; Hanisch, N.; Biedermann, K.; Rudolph, M.; Brackmann, V.; Sanctis, C.; Jank, M.; Seidel, K.
Zeitschriftenaufsatz
2021Impact of the interface layer on the cycling behaviour and retention of ferroelectric hafnium oxide
Lederer, M.; Mertens, K.; Kia, A.M.; Emara, J.; Olivo, R.; Raffel, Y.; Lehninger, D.; Ali, T.; Kühnel, K.; Seidel, K.; Kämpfe, T.; Eng, L.M.
Zeitschriftenaufsatz
2021Impact of the Nonlinear Dielectric Hysteresis Properties of a Charge Trap Layer in a Novel Hybrid High-Speed and Low-Power Ferroelectric or Antiferroelectric HSO/HZO Boosted Charge Trap Memory
Ali, T.; Mertens, K.; Olivo, R.; Rudolph, M.; Oehler, S.; Kuhnel, K.; Lehninger, D.; Muller, F.; Hoffmann, R.; Schramm, P.; Biedermann, K.; Metzger, J.; Binder, R.; Czernohorsky, M.; Kampfe, T.; Muller, J.; Seidel, K.; Houdt, J. Van; Eng, L.M.
Zeitschriftenaufsatz
2021Influence of Annealing Temperature on the Structural and Electrical Properties of Si-Doped Ferroelectric Hafnium Oxide
Lederer, M.; Bagul, P.; Lehninger, D.; Mertens, K.; Reck, A.; Olivo, R.; Kämpfe, T.; Seidel, K.; Eng, L.M.
Zeitschriftenaufsatz
2021Influence of antiferroelectric-like behavior on tuning properties of ferroelectric HZO-based varactors
Abdulazhanov, S.; Lederer, M.; Lehninger, D.; Ali, T.; Emara, J.; Olivo, R.; Kämpfe, T.
Zeitschriftenaufsatz
2021Influence of microstructure on the variability and current percolation paths in ferroelectric hafnium oxide based neuromorphic FeFET synapses
Lederer, M.; Müller, F.; Varanasi, A.; Olivio, R.; Mertens, K.; Lehninger, D.; Raffel, Y.; Hoffmann, R.; Ali, T.; Seidel, K.; Kämpfe, T.; Eng, L.M.
Konferenzbeitrag
2021On the Origin of Wake-Up and Antiferroelectric-Like Behavior in Ferroelectric Hafnium Oxide
Lederer, M.; Olivo, R.; Lehninger, D.; Abdulazhanov, S.; Kämpfe, T.; Kirbach, S.; Mart, C.; Seidel, K.; Eng, L.M.
Zeitschriftenaufsatz
2021Process influences on the microstructure of BEoL integrated ferroelectric hafnium zirconium oxide
Lederer, M.; Lehninger, D.; Abdulazhanov, S.; Reck, A.; Olivo, R.; Kämpfe, T.; Seidel, K.
Konferenzbeitrag
2021Room temperature PVD TiN to improve the ferroelectric properties of HZO films in the BEoL
Lehninger, D.; Mertens, K.; Gerlich, L.; Lederer, M.; Ali, T.; Seidel, K.
Zeitschriftenaufsatz
2021Substrate-dependent differences in ferroelectric behavior and phase diagram of Si-doped hafnium oxide
Lederer, M.; Mertens, K.; Olivo, R.; Kühnel, K.; Lehninger, D.; Ali, T.; Kämpfe, T.; Seidel, K.; Eng, L.M.
Zeitschriftenaufsatz
2021Tunability of Ferroelectric Hafnium Zirconium Oxide for Varactor Applications
Abdulazhanov, S.; Lederer, M.; Lehninger, D.; Mart, C.; Ali, T.; Wang, D.; Olivo, R.; Emara, J.; Kämpfe, T.; Gerlach, G.
Zeitschriftenaufsatz
2020Back-End-of-Line Compatible Low-Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation
Lehninger, D.; Olivo, R.; Ali, T.; Lederer, M.; Kämpfe, T.; Mart, C.; Biedermann, K.; Kühnel, K.; Roy, L.; Kalkani, M.; Seidel, K.
Zeitschriftenaufsatz
2020Effect of Substrate Implant Tuning on the Performance of MFIS Silicon Doped Hafnium Oxide (HSO) FeFET Memory
Ali, T.; Kühnel, K.; Mertens, K.; Czernohorsky, M.; Rudolph, M.; Duhan, P.; Lehninger, D.; Hoffmann, R.; Steinke, P.; Müller, J.; Houdt, J. van; Seidel, K.; Eng, L.M.
Konferenzbeitrag
2020Energy harvesting in the back-end of line with CMOS compatible ferroelectric hafnium oxide
Mart, C.; Abdulazhanov, S.; Czernohorsky, M.; Kämpfe, T.; Lehninger, D.; Falidas, K.; Eßlinger, S.; Kühnel, K.; Oehler, S.; Rudolph, M.; Wiatr, M.; Kolodinski, S.; Seidel, R.; Weinreich, W.; Eng, L.M.
Konferenzbeitrag
2020Furnace annealed HfO2-Films for the Integration of Ferroelectric Functionalities into the BEoL
Lehninger, D.; Ali, T.; Olivo, R.; Lederer, M.; Kämpfe, T.; Mertens, K.; Seidel, K.
Konferenzbeitrag
2020Heavy Ion Irradiation Effects on Structural and Ferroelectric Properties of HfO2 Films
Kämpfe, T.; Vogel, T.; Olivo, R.; Lederer, M.; Kaiser, N.; Petzold, S.; Ali, T.; Lehninger, D.; Trautmann, C.; Alff, L.; Seidel, K.
Konferenzbeitrag
2020Impact of Ferroelectric Wakeup on Reliability of Laminate based Si-doped Hafnium Oxide (HSO) FeFET Memory Cells
Ali, T.; Kühnel, K.; Czernohorsky, M.; Rudolph, M.; Pätzold, B.; Olivo, R.; Lehninger, D.; Mertens, K.; Müller, F.; Lederer, M.; Hoffmann, R.; Mart, C.; Kalkani, M.N.; Steinke, P.; Kämpfe, T.; Müller, J.; Houdt, J. van; Seidel, K.; Eng, L.M.
Konferenzbeitrag
2020A novel hybrid high-speed and low power antiferroelectric HSO boosted charge trap memory for high-density storage
Ali, T.; Mertens, K.; Olivo, R.; Rudolph, M.; Oehler, S.; Kühnel, K.; Lehninger, D.; Müller, F.; Lederer, M.; Hoffmann, R.; Schramm, P.; Biedermann, K.; Kia, A.M.; Metzger, J.; Binder, R.; Czernohorsky, M.; Kämpfe, T.; Müller, J.; Seidel, K.; Houdt, J.V. van; Eng, L.M.
Konferenzbeitrag
2020A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: Pyroelectricity and Reliability
Ali, T.; Kühnel, K.; Czernohorsky, M.; Mart, C.; Rudolph, M.; Pätzold, B.; Lehninger, D.; Olivo, R.; Lederer, M.; Müller, F.; Hoffmann, R.; Metzger, J.; Binder, R.; Steinke, P.; Kämpfe, T.; Müller, J.; Seidel, K.; Eng, L.M.
Zeitschriftenaufsatz
2020A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: A Temperature-Modulated Operation
Ali, T.; Kühnel, K.; Czernohorsky, M.; Mart, C.; Rudolph, M.; Pätzold, B.; Lederer, M.; Olivo, R.; Lehninger, D.; Müller, F.; Hoffmann, R.; Metzger, J.; Binder, R.; Steinke, P.; Kämpfe, T.; Müller, J.; Seidel, K.; Eng, L.M.
Zeitschriftenaufsatz
2020Whether Ge-Rich ZrO2 and Ge-Rich HfO2 Materials Have Similar Reaction on Annealing Treatment?
Khomenkova, L.; Lehninger, D.; Agocs, E.; Petrik, P.; Portier, X.; Korsunska, N.; Melnichuk, O.; Gourbilleau, F.; Heitmann, J.
Konferenzbeitrag
2019Local crystallographic phase detection and texture mapping in ferroelectric Zr doped HfO2 films by transmission-EBSD
Lederer, M.; Kämpfe, T.; Olivo, R.; Lehninger, D.; Mart, C.; Kirbach, S.; Ali, T.; Polakowski, P.; Roy, L.; Seidel, K.
Zeitschriftenaufsatz
2019A Multilevel FeFET Memory Device based on Laminated HSO and HZO Ferroelectric Layers for High-Density Storage
Ali, T.; Olivo, R.; Lederer, M.; Hoffmann, R.; Steinke, P.; Zimmermann, K.; Mühle, U.; Seidel, K.; Müller, J.; Polakowski, P.; Kühnel, K.; Czernohorsky, M.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Lehninger, D.; Müller, F.
Konferenzbeitrag
2011Comparison of PVD, PECVD and PEALD Ru-TaN films with high Ru concentration for direct Cu plating
Wojcik, H.; Merkel, U.; Bartha, J.W.; Li, J.; Lehninger, D.; Engelmann, H.J.; Popatov, P.; Gluch, J.; Knaut, M.; Strehle, S.; Wenzel, C.; Adolphi, B.; Neumann, V.; Liske, R.
Konferenzbeitrag
2009Surface-sensitive strain analysis of Si/SiGe line structures by raman and UV-raman spectroscopy
Roelke, M.; Hecker, M.; Hermann, P.; Lehninger, D.; Ritz, Y.; Zschech, E.; Vartanian, V.
Konferenzbeitrag