Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017Charakterisierung der Zuverlässigkeit in der High-k Metal Gate Technologie
Drescher, Maximilian; Erben, Elke; Grass, Carsten; Trentzsch, Martin; Lazarevic, Florian; Leitsmann, Roman; Plaenitz, Philipp; Mchedlidze, Teimuraz; Seidel, Konrad; Liske, Romy; Bartha, Johann Wolfgang
Konferenzbeitrag
2017Modeling the effects of lanthanum, nitrogen, and fluorine treatments of Si-SiON-HfO2-TiN gate stacks in 28 nm high-k-metal gate technology
Leitsmann, R.; Lazarevic, F.; Drescher, M.; Erben, E.
Zeitschriftenaufsatz
2017Nitrogen Engineering in the Ultrathin SiO2 Interface Layer of High- k CMOS Devices: A First-Principles Investigation of Fluorine, Oxygen, and Boron Defect Migration
Lazarevic, F.; Leitsmann, R.; Drescher, M.; Erben, E.; Plänitz, P.; Schreiber, M.
Zeitschriftenaufsatz
2015Fluorine interface treatments within the gate stack for defect passivation in 28 nm high-k metal gate technology
Drescher, M.; Naumann, A.; Sundqvist, J.; Erben, E.; Grass, C.; Trentzsch, M.; Lazarevic, F.; Leitsmann, R.; Plaenitz, P.
Zeitschriftenaufsatz
2014Influence of nitrogen trap states on the electronic properties of high-k metal gate transistors
Ocker, J.; Kupke, S.; Slesazeck, S.; Mikolajick, T.; Erben, E.; Drescher, M.; Naumann, A.; Lazarevic, F.; Leitsmann, R.
Konferenzbeitrag