Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1994Adhesion problems in deep-etch X-ray lithography caused by fluorescence radiation from the plating-base
Pantenburg, F.J.; El-Kholi, A.; Mohr, J.; Schulz, J.; Oertel, H.K.; Chlebek, J.; Huber, H.-L.
Zeitschriftenaufsatz
1994Galvanoplated 3D coils for micro systems
Löchel, B.; Macioßek, A.; König, M.; Quenzer, H.J.; Huber, H.-L.
Zeitschriftenaufsatz
1994Galvanoplated 3D structures for micro systems
Löchel, B.; Maciossek, A.; König, M.; Quenzer, H.J.; Huber, H.-L.
Konferenzbeitrag
1994Impact of chuck flatness on wafer distortion and stepper overlay - comparison of experimental and FEM results
Stauch, H.; Simon, K.; Scheunemann, H.U.; Huber, H.-L.
Zeitschriftenaufsatz
1993Application of e-beam nanolithography for absorber structuring of high resolution x-ray masks
Köhler, C.; Brünger, W.H.; Ehrlich, C.; Huber, H.-L.; Reimer, K.
Zeitschriftenaufsatz
1993Diamond membrane with controlled stress for submicron lithography
Schäfer, L.; Bluhm, A.; Klages, C.-P.; Löchel, B.; Buchmann, L.-M.; Huber, H.-L.
Zeitschriftenaufsatz
1993Diamond membranes with controlled stress for submicron lithography
Bluhm, A.; Löchel, B.; Buchmann, L.-M.; Huber, H.-L.; Klages, C.-P.; Schäfer, L.
Zeitschriftenaufsatz, Konferenzbeitrag
1993Fabrication of magnetic microstructures by using thick layer resists
Löchel, B.; Maciossek, A.; König, M.; Huber, H.-L.; Bauer, G.
Konferenzbeitrag
1993Impact of chuck flatness on wafer distortion and stepper overlay
Simon, K.; Huber, H.-L.; Gabeli, F.; Scheunemann, H.U.
Konferenzbeitrag
1993Nanostructure patterning with SOR X-ray lithography
Chlebek, J.; Huber, H.-L.; Oertel, H.K.; Reimer, K.
Konferenzbeitrag
1993Sub-100 nm pattern generation by means of focused electrons, ion projection and x-ray lithography
Huber, H.-L.
Konferenzbeitrag
1993Weiterentwicklung der Röntgenlithographie
Huber, H.-L.
Aufsatz in Buch
1992Complete X-ray lithography processing of an 8-level 0.4 micron CMOS test device
Staudt-Fischbach, P.; Windbracke, W.; Bernt, H.; Zwicker, G.; Friedrich, D.; Hemicker, P.; Lange, P.; Schliwinski, H.-J.; Huber, H.-L.; Scheunemann, U.; Simon, K.
Konferenzbeitrag
1992Diamond membrane based X-ray masks
Löchel, B.; Huber, H.-L.; Klages, C.-P.; Schäfer, L.; Bluhm, A.
Konferenzbeitrag
1992Diamond membrane based x-ray masks
Huber, H.-L.
Tagungsband
1992Diamond membranes for X-ray masks
Löchel, B.; Schliwinski, H.-J.; Huber, H.-L.; Trube, J.; Klages, C.-P.; Lüthje, H.; Schäfer, L.
Konferenzbeitrag
1992In situ temperature and distortion measurements of x-ray masks during SR-lithography
Trube, J.; Bernt, H.; Engler, K.; Huber, H.-L.
Konferenzbeitrag
1992The influence of post-exposure bake on linewidth control for the resist system RAY-PN-AZPN 100- in X-ray mask fabrication
Chlebek, J.; Schulz, T.; Huber, H.-L.; Grimm, J.
Zeitschriftenaufsatz
1991The influence of post-exposure bake on linewidth control for the resist system RAY-PN-AZPN 100- in X-ray mask fabrication
Chlebek, J.; Schulz, T.; Grimm, J.; Huber, H.-L.
Konferenzbeitrag
1991Investigation of the process latitude for sub-half-micron pattern replication in x-ray lithography
Oertel, H.K.; Huber, H.-L.; Weiß, M.
Konferenzbeitrag
1991Modelling of illumination effects on resist profiles in X-ray lithography
Oertel, H.; Weiß, M.; Huber, H.-L.; Vladimirsky, Y.; Maldonado, J.R.
Konferenzbeitrag
1991Status of the compact synchrotron radiation source cosy and first exposure experiments
Schmidt, M.; Oertel, D.W.; Hartrott, M.v.; Weihreter, E.; Oertel, H.K.; Huber, H.-L.
Konferenzbeitrag
1991Thickness inhomogeneity during silicon X-ray mask membrane fabrication: generation and prevention
Löchel, B.; Macioßek, A.; Huber, H.-L.; König, M.
Konferenzbeitrag
1990Infrared-measurement of X-ray mask heating during SR-lithography
Trube, J.; Huber, H.-L.; Mourikis, S.; Koch, E.E.; Bernstoff, S.
Konferenzbeitrag
1990Procedure and results of mask fabrication via X-ray lithography
Grimm, J.; Trube, J.; Huber, H.-L.
Konferenzbeitrag
1990Silicon membrane mask blanks for X-ray and ion projection lithography
Löchel, B.; Chlebek, J.; Huber, H.-L.; Macioßek, A.; Grimm, J.
Zeitschriftenaufsatz, Konferenzbeitrag
1989Application of pulse plating to form lead absorber patterns for x-ray masks
Löchel, B.; Trube, J.; Windbracke, W.; Huber, H.-L.
Zeitschriftenaufsatz
1989Computer-aided resist modelling with extended xmas in X-ray lithography
Chlebek, J.; Huber, H.-L.; Oertel, H.; Dammel, R.; Lingnau, J.; Theis, J.; Weiß, M.
Zeitschriftenaufsatz
1989Fabrication of 0.5 mym MOS test devices by application of X-ray lithography at all levels
Friedrich, D.; Bernt, H.; Windbracke, W.; Zwicker, G.; Huber, H.-L.
Konferenzbeitrag
1989Fabrication of 0.5 myn- and p-type metal-oxide-semiconductor test devices using x-ray lithography
Zwicker, G.; Windbracke, W.; Bernt, H.; Friedrich, D.; Huber, H.-L.; Krullmann, E.; Pelka, M.; Lange, P.; Hermicker, P.; Staudt-Fischbach, P.
Zeitschriftenaufsatz
1989Fabrication of sub-half mym patterns for MOS devices by beams of X-ray lithography and plasma etching
Windbracke, W.; Huber, H.-L.; Staudt, P.; Zwicker, G.
Zeitschriftenaufsatz
1989Negative-tone high-resolution photocatalytic resist for X-ray lithography
Huber, H.-L.; Oertel, H.; Trube, J.; Dammel, R.; Dössel, K.F.; Lingnau, J.; Theis, J.
Zeitschriftenaufsatz
1989State of the art of pattern placement accuracy of silicon X-ray master masks
Pongratz, S.; Mescheder, U.; Ehrlich, C.; Huber, H.-L.; Kohlmann, K.; Windbracke, W.
Konferenzbeitrag
1988Subhalf micron critical dimension control in X-ray lithography mask technology
Mescheder, U.; Mund, F.; Trube, J.; Windbracke, W.; Huber, H.-L.; Pongratz, S.
Konferenzbeitrag
1987Application of lead electroplating for X-ray absorber patterning
Trube, J.; Huber, H.-L.; Löchel, B.; Windbracke, W.
Zeitschriftenaufsatz
1987Fabrication of halfmicron MOSFETs by means of X-ray lithography
Huber, H.-L.; Lauer, V.; Bauer, F.; Korec, J.; Balk, P.
Zeitschriftenaufsatz
1987Half micrometer N-MOS technology using X-ray lithography
Huber, H.-L.; Lauer, V.; Bauer, F.; Korec, J.; Balk, P.
Konferenzbeitrag
1987Influence of phase shift on pattern transfer in X-rax lithography
Oertel, H.; Huber, H.-L.; Weiß, M.
Zeitschriftenaufsatz
1987The influence of photoelectronics and fluorescence radiation on resolution in X-rax lithography
Chlebek, J.; Heuberger, A.; Huber, H.-L.; Betz, H.
Zeitschriftenaufsatz
1987Linewidth metrology for X-rax masks with subhalfmicron feature size
Huber, H.-L.; Mescheder, U.; Mund, F.
Zeitschriftenaufsatz
1987Photocatalytic novolak - based positive resist for X-ray lithography - kinetics and simulation
Huber, H.-L.; Oertel, H.; Dössel, K.F.; Dammel, R.; Lingnau, J.; Theis, J.
Zeitschriftenaufsatz
1987Radiation damage effects in boron nitride mask membranes subjected to x-ray exposures
Betz, H.; Huber, H.-L.; Oertel, H.; Johnson, W.A.; Levy, R.A.; Resnick, D.J.; Saunders, T.E.; Yanof, A.W.
Zeitschriftenaufsatz
1987Temperaturänderungen von Silizium-Membranen durch Absorption von Röntgenstrahlung
Trube, J.; Huber, H.-L.
Abstract
1986Critical dimension control in x-ray masks with electroplated gold absorbers
Windbracke, W.; Betz, H.; Huber, H.-L.; Pilz, W.; Pongratz, S.
Konferenzbeitrag
1986Highly-sensitive novolak-based positive x-ray resist
Huber, H.-L.; Oertel, H.; Doessel, K.-F.
Konferenzbeitrag
1986Resolution limits in x-ray lithography calculated by means of x-ray lithography simulator XMAS
Betz, H.; Heinrich, K.; Heuberger, A.; Huber, H.-L.; Oertel, H.
Zeitschriftenaufsatz
1986Silicon x-ray masks - pattern placement and overlay accuracy
Betz, H.; Huber, H.-L.; Pongratz, S.; Rohrmoser, W.; Windbracke, W.; Mescheder, U.
Konferenzbeitrag
1985Synchrotron lithography - the way to sub-micron features with single layer resist
Huber, H.-L.; Betz, H.; Heuberger, A.
Aufsatz in Buch
1984Application of diazo-type resists in synchrotron lithography
Huber, H.-L.; Betz, H.; Heuberger, A.; Pongratz, S.
Konferenzbeitrag