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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2001Reliability of ultra-thin N2O-nitrided oxides grown by RTP under low-pressure in different gas atmospheres
Beichele, M.; Bauer, A.J.; Herden, M.; Ryssel, H.
Zeitschriftenaufsatz
2001Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode
Herden, M.; Bauer, A.J.; Beichele, M.; Ryssel, H.
Zeitschriftenaufsatz
2001Ti-silicide formation during isochronal annealing followed by in-situ ellipsometry
Stark, T.; Gutowski, L.; Herden, M.; Grunleitner, H.; Kohler, S.; Hundhausen, M.; Ley, L.
Zeitschriftenaufsatz
2000Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode of PMOS devices
Herden, M.; Bauer, A.J.; Ryssel, H.
Zeitschriftenaufsatz
1999Reliability of ultra-thin gate oxides grown in low-pressure N20 ambient or on nitrogen-implanted silicon
Bauer, A.J.; Beichele; Herden, M.; Ryssel, H.
Konferenzbeitrag
1997Reduction of lateral parasitic current flow by buried recombination layers formed by high-energy implantation of C or O into silicon
Bogen, S.; Herden, M.; Frey, L.; Ryssel, H.
Konferenzbeitrag