Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2001Comparison of simulation approaches for chemically amplified resists
Erdmann, A.; Henke, W.; Robertson, S.; Richter, E.; Tollkühn, B.; Hoppe, W.
Konferenzbeitrag
1999Modeling of edge roughness in ion projection lithography
Henke, W.; Torkler, M.
Zeitschriftenaufsatz, Konferenzbeitrag
1998Integrated three-dimensional topography simulation and its application to dual-damascene processing
Bär, E.; Henke, W.; List, S.; Lorenz, J.
Konferenzbeitrag
1998One-level gray-tone design. Mask data preparation and pattern transfer
Reimer, K.; Henke, W.; Hofmann, U.; Merz, P.; Wagner, B.
Aufsatz in Buch
1998Simulation of optical lithography
Erdmann, A.; Henke, W.
Konferenzbeitrag
1997Influence of optical nonlinearities of photoresists on the photolithographic process
Erdmann, A.; Henderson, C.L.; Willson, C.G.; Henke, W.
Konferenzbeitrag
1997Influence of optical nonlinearities of the photoresist on the photolithographic process
Erdmann, A.; Henderson, C.L.; Willson, C.G.; Henke, W.
Konferenzbeitrag
1997Integrated three-dimensional topography simulation of contact hole processing
Bär, E.; Benvenuti, A.; Henke, W.; Jünemann, B.; Kalus, C.; Niedermaier, P.; Lorenz, J.
Konferenzbeitrag
1996New concept for applying edge line phase-shifting masks to arbitrary mask layouts
Weiß, M.; Henke, W.
Zeitschriftenaufsatz
1996One-level gray-tone design. Mask data preparation and pattern transfer
Reimer, K.; Henke, W.; Quenzer, H.J.; Pilz, W.; Wagner, B.
Konferenzbeitrag
1996One-level gray-tone lithography for micro optical components
Reimer, K.; Henke, W.; Quenzer, H.J.; Demmeler, R.; Wagner, B.
Konferenzbeitrag
1996Simulation of light propagation in optical linear and nonlinear resist layers by finite difference beam propagation and other methods
Erdmann, A.; Henke, W.
Zeitschriftenaufsatz
1996Three-dimensional process simulation
Lorenz, J.; Baccus, B.; Henke, W.
Zeitschriftenaufsatz
19953D simulation of topography and doping processes at FhG
Lorenz, J.; Bär, E.; Burenkov, A.; Henke, W.; Tietzel, K.; Weiß, M.
Konferenzbeitrag
1995Fabrication of relief-topographic surfaces with one-step UV-lithographic
Quenzer, H.J.; Henke, W.; Hoppe, W.; Pilz, W.; Reimer, K.; Wagner, B.
Zeitschriftenaufsatz
1995Microfabrication of complex surface topographies using gray-tone lithography
Wagner, B.; Quenzer, H.J.; Henke, W.; Hoppe, W.; Pilz, W.
Zeitschriftenaufsatz
1995Simulation assisted design of processes for gray-tone lithography
Henke, W.; Hoppe, W.; Staudt-Fischbach, P.; Wagner, B.; Quenzer, H.J.
Konferenzbeitrag
1995Three-dimensional simulation of topography and doping processes at FhG
Lorenz, J.; Bär, E.; Burenkov, A.; Henke, W.; Tietzel, K.; Weiß, M.
Aufsatz in Buch
1994Simulation and experimental study of gray-tone lithography for the fabrication of arbitrarily shaped surfaces
Henke, W.; Hoppe, W.; Quenzer, H.J.; Staudt-Fischbach, P.; Wagner, B.
Konferenzbeitrag
1993The significance and detection of transmissive defects on 5X reticles
Zarbrick, L.S.; Henke, W.
Konferenzbeitrag
1992Increasing resolution and depth of focus in optical microlithography through spatial filtering techniques
Glaubitz, U.; Henke, W.
Konferenzbeitrag
1991Simulation of defects in 3-dimensional resist profiles in optical lithography
Mewes, D.; Weiß, M.; Schießl-Hoyler, R.; Czech, G.; Henke, W.
Zeitschriftenaufsatz
1991A study of reticle defects imaged into three-dimensional developed profiles of positive photoresist using the SOLID lithography simulator
Mewes, D.; Schießl-Hoyler, R.; Czech, G.; Henke, W.; Weiß, M.
Zeitschriftenaufsatz
1991Three dimensional simulation of reticle defects in optical lithography
Henke, W.; Weiß, M.
Konferenzbeitrag
1990Assessment of high contrast g- and i-line resists using high numerical aperture exposure tools
Binder, J.; Czech, G.; Gutmann, A.; Henke, W.; Karl, J.; Mager, L.; Sarlette, D.
Konferenzbeitrag
1990Laser beam welding of car body sheets and their mechano-technological properties
Seifert, -; Behler, K.; Beyer, E.; Henke, W.; Imhoff, R.
Konferenzbeitrag
1990Simulation of lithographic images and resist profiles
Henke, W.; Czech, G.
Konferenzbeitrag
1990Simulation of proximity printing
Schwalm, R.; Henke, W.; Pelka, J.; Weiß, M.
Zeitschriftenaufsatz