Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Modeling of block copolymer dry etching for directed self-assembly lithography
Belete, Zelalem; Bär, Eberhard; Erdmann, Andreas
Konferenzbeitrag
20163D simulation of light exposure and resist effects in laser direct write lithography
Onanuga, Temitope; Erdmann, Andreas
Konferenzbeitrag
2016Challenges for predictive EUV mask modeling
Evanschitzky, Peter; Erdmann, Andreas
Vortrag
2016Efficient simulation of EUV pellicles
Evanschitzky, Peter; Erdmann, Andreas
Vortrag
2016Inverse image modeling for defect detection and optical system characterization
Xu, Dongbo
: Erdmann, Andreas
Dissertation
2014Artificial evolution for the optimization of lithographic process conditions
Fühner, Tim
: Erdmann, Andreas
Dissertation
2014Compact mask models for optical projection lithography
Agudelo Moreno, Viviana
: Erdmann, Andreas
Dissertation
2013Efficient simulation of extreme ultraviolet multilayer defects with rigorous data base approach
Evanschitzky, Peter; Shao, Feng; Erdmann, Andreas
Zeitschriftenaufsatz
2012Efficient simulation of EUV multilayer defects with rigorous data base approach
Evanschitzky, Peter; Shao, Feng; Erdmann, Andreas
Konferenzbeitrag
2011Compensation of mask induced aberrations by projector wavefront control
Evanschitzky, Peter; Shao, Feng; Fühner, Tim; Erdmann, Andreas
Konferenzbeitrag
2011Image simulation of projection systems in photolithography
Evanschitzky, Peter; Fühner, Tim; Erdmann, Andreas
Konferenzbeitrag
2011Numerical optimization of illumination and mask layout for the enlargement of process windows and for the control of photoresist profiles in proximity printing
Motzek, Kristian; Partel, Stefan; Vogler, Uwe; Erdmann, Andreas
Konferenzbeitrag
2011Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes
Rudolph, Oliver; Evanschitzky, Peter; Erdmann, Andreas; Bär, Eberhard; Lorenz, Jürgen
Poster