Fraunhofer-Gesellschaft

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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1992A second look at reactive ion-beam etching and chemically-assisted ion-beam etching
Eisele, K.M.
Zeitschriftenaufsatz
1990Photolytic silicon nitride deposition for gallium arsenide by 193 excimer laser radiation
Rothemund, W.; Dischler, B.; Eisele, K.M.
Zeitschriftenaufsatz
1987Electrode separation and convex electrode surfaces in plasma etching
Eisele, K.M.
Zeitschriftenaufsatz
1986Deposition of polymer film patterns by ion beams
Fritzsche, C.R.; Eisele, K.M.
Zeitschriftenaufsatz
1986Etching of SiO2 in a narrowly confined plasma of high power density
Eisele, K.M.
Zeitschriftenaufsatz
19851.54-micro m electroluminescence of erbium-doped silicon grown by molecular beam epitaxy.
Pomrenke, G.; Axmann, A.; Schneider, J.; Eisele, K.M.; Haydl, W.H.; Ennen, H.
Zeitschriftenaufsatz
1984Effects of heavy metal contamination from corrosive gas and dopant handling equipment in silicon wafer processing
Klausmann, E.; Eisele, K.M.
Zeitschriftenaufsatz
1983Deposition of masking films by ion beam induced polymerization.
Eisele, K.M.; Fritzsche, C.
Aufsatz in Buch
1982Die Anwendung der Plasmamassenspektrometrie beim Plasmaaetzen
Eisele, K.M.
Zeitschriftenaufsatz
1982Phosphorus pentaflouride and sulfurylfluoride applied to etch SiO2 in search for higher selectivities
Eisele, K.M.
Zeitschriftenaufsatz