Fraunhofer-Gesellschaft

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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1994Direct write pattern placement accuracy for E-beam nanolithography
Reimer, K.; Ehrlich, C.; Köhler, C.; Brünger, W.H.
Konferenzbeitrag
1993Application of e-beam nanolithography for absorber structuring of high resolution x-ray masks
Köhler, C.; Brünger, W.H.; Ehrlich, C.; Huber, H.-L.; Reimer, K.
Zeitschriftenaufsatz
1992E-beam written optically transparent x-ray masks - four levels for an industrial VLSI chip with megabit design rules
Jacobs, E.P.; Köhler, C.; Kohlmann, K.T.; Petschner, M.; Reimer, K.; Breithaupt, B.; Demmeler, R.; Ehrlich, C.
Konferenzbeitrag
1989The E-beam application of highly sensitive positive and negative tone X-ray resists for X-ray mask making
Dammel, R.; Demmeler, R.; Ehrlich, C.; Kohlmann, K.; Lingnau, J.; Pongratz, S.; Reimer, K.; Scheunemann, U.; Theis, J.
Konferenzbeitrag
1989E-beam application of highly sensitive positive and negative-tone resists for x-ray mask making
Dammel, R.; Demmeler, R.; Ehrlich, C.; Hessemer, W.; Kohlmann, K.; Lingnau, J.; Pongratz, S.; Reimer, K.; Scheunemann, U.; Theis, J.
Konferenzbeitrag
1989One-layer technique for absorber structuring of E-beam written master masks for X-ray lithography
Ehrlich, C.; Goepel, U.; Demmeler, R.; Pongratz, S.; Reimer, K.; Dammel, R.; Lignau, J.; Theis, J.
Konferenzbeitrag
1989State of the art of pattern placement accuracy of silicon X-ray master masks
Pongratz, S.; Mescheder, U.; Ehrlich, C.; Huber, H.-L.; Kohlmann, K.; Windbracke, W.
Konferenzbeitrag
1987High resolution e-beam lithography for X-ray mask making
Demmeler, R.; Ehrlich, C.; Pongratz, S.; Reimer, K.
Zeitschriftenaufsatz