Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2021Automatisierte Rockwell-Schichthaftungsprüfung - AUROS
Gäbler, Jan; Bethke, Reinhold; Rauhut, Markus; Hatic, Damjan; Eder, Michael; Eder, Stephan; Bastürk, Serhan
Bericht
2021Rockwell-Schichthaftungstest - der maschinelle Blick
Gäbler, Jan; Bethke, Reinhold; Hatic, Damjan; Rauhut, Markus; Weibel, Thomas; Cheng, Xiaoyin; Eder, Michael; Eder, Stephan; Bagcivan, Nazlim; Bastürk, Serhan
Zeitschriftenaufsatz
2021To-SYN-fuel project implements a new integrated process to produce synthetic fuels
Hornung, A.; Daschner, R.; Eder, S.; Ouadi, M.; Jahangiri, H.; Graute, L.; Zhou, J.; Lieftink, D.; Grassi, A.; Capaccioli, S.; Contin, A.; Righi, S.; Marazza, D.; Lama, V.; Rapone, I.; Langley, M.; Tuck, C.; Claret Carles, A.
Konferenzbeitrag
2020An automated evaluation for the Rockwell indentation test
Bethke, Reinhold; Gäbler, Jan; Rauhut, Markus; Hatic, Damjan; Moghiseh, Ali; Weibel, Thomas; Eder, Michael; Eder, Stephan; Bastürk, Serhan; Bagcivan, Nazlim
Konferenzbeitrag
2020Automated Rockwell indentation test for the evaluation of coating adhesion
Bethke, Reinhold; Gäbler, Jan; Rauhut, Markus; Hatic, Damjan; Moghiseh, Ali; Weibel, Thomas; Eder, Michael; Eder, Stephan; Bastürk, Serhan; Bagcivan, Nazlim; Thomalla, Markus; Kirchner, Christian; Becker, Jürgen; Zimmermann, Katja; Büchel, Christian; Dannappel, Kai
Poster
2020Integrated tar-free thermochemical air/steam fixed-bed updraft gasification of TCR®-biochar
Eder, Stefan
Vortrag
2018Development and validation of a meshless 3D material point method for simulating the micro-milling process
Leroch, S.; Eder, S.J.; Ganzenmüller, Georg; Murillo, L.J.S.; Rodriguez Ripoll, M.
Zeitschriftenaufsatz
2016Smooth particle hydrodynamics simulation of damage induced by a spherical indenter scratching a viscoplastic material
Leroch, S.; Varga, M.; Eder, S.J.; Vernes, A.; Rodriguez Ripoll, M.; Ganzenmüller, G.
Zeitschriftenaufsatz
2001Reference plate manufacturing process for the ion projection lithography pattern lock system
Letzkus, F.; Butschke, J.; Irmscher, M.; Reuter, C.; Springer, R.; Eder, S.; Loschner, H.; Eberhardt, R.; Mohaupt, M.; Ehrmann, A.; Mathuni, J.; Panzer, B.; Struck, T.
Zeitschriftenaufsatz
1997DUV resist UV II HS applied to high resolution e-beam lithography and to masked ion beam proximity and reduction printing
Brünger, W.H.; Buschbeck, H.; Cekan, E.; Eder, S.; Fedynyshyn, T.H.; Hertlein, W.G.; Hudek, P.; Kostic, I.; Loeschner, H.; Rangelow, J.W.; Torkler, M.
Konferenzbeitrag