Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2015Nano patterning at Fraunhofer IPMS-CNT: Fabrication of silicon master for NIL via e-beam direct write
Thrun, Xaver; Choi, Kang-Hoon; Gutsch, Manuela; Hohle, Christoph; Rudolph, Matthias; Seidel, Konrad
Poster
2015Sensitivity analysis for high accuracy proximity effect correction
Thrun, Xaver; Browning, Clyde; Choi, Kang-Hoon; Figueiro, Thiago; Hohle, Christoph; Saib, Mohamed; Schiavone, Patrick; Bartha, Johann W.
Konferenzbeitrag
2015Verification of E-Beam direct write integration into 28nm BEOL SRAM technology
Hohle, Christoph; Choi, Kang-Hoon; Gutsch, Manuela; Hanisch, Norbert; Seidel, Robert; Steidel, Katja; Thrun, Xaver; Werner, Thomas
Konferenzbeitrag
2014Effective corner rounding correction in the data preparation of electron beam lithography
Choi, Kang-Hoon; Browning, Clyde; Figueiro, Thiago; Hohle, Christoph; Kaiser, Michael; Schiavone, Patrick
Konferenzbeitrag
2014Integration of e-beam direct write in BEOL processes of 28nm SRAM technology node using mix and match
Gutsch, Manuela; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Steidel, Katja; Thrun, Xaver; Seidel, Robert; Werner, Thomas
Konferenzbeitrag
2013Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography
Thrun, Xaver; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Steidel, Katja; Guerrero, Douglas; Figueiro, Thiago; Bartha, Johann W.
Konferenzbeitrag
2013Influence of high-energy electron irradiation on ultra-low-k characteristics and transistor performance
Steidel, Katja; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Seidel, Robert; Thrun, Xaver; Werner, Thomas
Konferenzbeitrag
2012Demonstration of 22nm SRAM features with patternable hafnium oxide based resist material using electron-beam lithography
Thrun, Xaver; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Grenville, Andrew; Stowers, Jason K.; Bartha, Johann W.
Konferenzbeitrag
2012Feasibility study of optical/e-beam complementary lithography
Hohle, Christoph; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Rudolph, Matthias; Thrun, Xaver; Jaschinsky, Philipp; Kahlenberg, Frank; Klein, Christof; Klikovits, Jan
Konferenzbeitrag
2011Efficient large volume data preparation for electron beam lithography for sub-45nm node
Choi, Kang-Hoon; Gutsch, Manuela; Freitag, Martin; Hohle, Christoph
Konferenzbeitrag
2011Fast characterization of line end shortening and application of novel correction algorithms in e-beam direct write
Freitag, Martin; Choi, Kang-Hoon; Gutsch, Manuela; Hohle, Christoph; Galler, Reinhard; Krüger, Michael; Weidenmüller, Ulf
Zeitschriftenaufsatz
2008Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method
Keil, Katja; Choi, Kang-Hoon; Hohle, Christoph; Kretz, Johannes; Lutz, Tarek; Bettin, Lutz; Boettcher, Monika; Hahmann, Peter; Kliem, Karl-Heinz; Schnabel, Bernd; Irmscher, Mathias; Sailer, Holger
Konferenzbeitrag, Zeitschriftenaufsatz