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| 1998 | Free 3D shaping with grey-tone lithography and multidose e-beam writing
Kalus, M.; Frey, M.; Buchmann, L.-M.; Reimer, K.; Wagner, B. | Konferenzbeitrag |
| 1997 | Chemically amplified deep ultraviolet resist for positive tone ion exposure
Brünger, W.H.; Torkler, M.; Buchmann, L.-M.; Finkelstein, W. | Konferenzbeitrag |
| 1995 | Damage characterization of ion beam exposed metal-oxide-semiconductor varactor cells by charge to breakdown measurements
Brünger, W.H.; Buchmann, L.-M.; Naumann, F.; Friedrich, D.; Finkelstein, W.; Mohondro, R. | Konferenzbeitrag |
| 1993 | Diamond membrane with controlled stress for submicron lithography
Schäfer, L.; Bluhm, A.; Klages, C.-P.; Löchel, B.; Buchmann, L.-M.; Huber, H.-L. | Zeitschriftenaufsatz |
| 1993 | Diamond membranes with controlled stress for submicron lithography
Bluhm, A.; Löchel, B.; Buchmann, L.-M.; Huber, H.-L.; Klages, C.-P.; Schäfer, L. | Zeitschriftenaufsatz, Konferenzbeitrag |
| 1993 | Edge roughness of a 200 nm pitch resist pattern fabricated by ion projection lithography
Brünger, W.H.; Blaschke, J.; Torkler, M.; Buchmann, L.-M. | Zeitschriftenaufsatz |
| 1992 | Fabrication of 3.5 GHz surface acoustic wave filters by ion projection lithography
Kreutzer, M.; Zwicker, G.; Fleischmann, B.; Brünger, W.H.; Buchmann, L.-M.; Torkler, M. | Konferenzbeitrag |
| 1992 | Lithography with high depth of focus by an ion projection system
Buchmann, L.-M.; Schnakenberg, U.; Torkler, M.; Löschner, H.; Stengl, G.; Traher, C.; Fallmann, W.; Stangl, G.; Cekan, E. | Konferenzbeitrag |
| 1992 | Lithography with high depth of focus by an ion projection system2
Buchmann, L.-M.; Schnakenberg, U.; Torkler, M.; Löschner, H.; Stengl, G.; Traher, C.; Fallmann, W.; Stangl, G.; Cekan, E. | Zeitschriftenaufsatz |
| 1992 | Novel surface imaging process with ion-beam lithography and dry development
Jadghold, U.A.; Buchmann, L.-M.; Pilz, W.; Torkler, M. | Konferenzbeitrag |
| 1992 | Repair of open stencil masks for ion projection lithography by E-beam induced metal deposition
Kohlmann, K.T.; Brünger, W.H.; Buchmann, L.-M. | Konferenzbeitrag |
| 1992 | Stability and electronic adjustment of ion images projected at 10 x reduction
Brünger, W.H.; Buchmann, L.-M.; Torkler, M. | Zeitschriftenaufsatz |
| 1992 | Stress modification and characterization of thin SiC films grown by plasma-enhanced chemical vapour deposition
Schliwinski, H.-J.; Pelka, M.; Windbracke, W.; Lange, P.; Buchmann, L.-M.; Csepregi, L. | Zeitschriftenaufsatz |
| 1991 | Characterization of silicon open stencil masks in an ion projection lithography machine
Mescheder, U.; Buchmann, L.-M.; Torkler, M. | Konferenzbeitrag |
| 1990 | Analysis of a CF4/O2 plasma using emission, laser-induced fluorescence, mass, and Langmuir spectroscopy
Buchmann, L.-M.; Heinrich, F.; Hoffmann, P.; Janes, J. | Zeitschriftenaufsatz |
| 1990 | Ion projection lithography - electronic alignment and dry development of IPL exposed resist materials
Buchmann, L.-M.; Heuberger, A.; Fallmann, W.; Paschke, F.; Stangl, G.; Chalupka, A.; Fegerl, J.; Löschner, H.; Malek, L.; Nowak, R.; Stengl, G.; Traher, C.; Wolf, P.; Fischer, R. | Zeitschriftenaufsatz |
| 1988 | Sub-0.5-mym lithography with a new ion projection lithography machine using silicon open stencil masks
Csepregi, L.; Heuberger, A.; Müller, K.P.; Chalupka, A.; Hammel, E.; Löschner, H.; Stengl, G.; Buchmann, L.-M. | Zeitschriftenaufsatz |
| 1987 | Open silicon stencil masks for demagnifying ion projection
Heuberger, A.; Buchmann, L.-M.; Csepregi, L.; Müller, K.P. | Konferenzbeitrag |
| 1987 | Open stencil masks for ion projection lithography
Buchmann, L.-M.; Csepregi, L.; Müller, K.P. | Konferenzbeitrag |
| 1985 | Mass spectrometry for controlling etch process of silicon containing layers
Buchmann, L.-M.; Pelka, J.; Mader, H. | Konferenzbeitrag |