Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2010Correlation between composition and stress for high density plasma CVD silicon nitride films
Sah, R.E.; Baumann, H.; Driad, R.; Wagner, J.
Zeitschriftenaufsatz
2010Investigation of stress in AIN thin films for piezoelectric MEMS
Sah, R.E.; Kirste, Lutz; Baeumler, Martina; Hiesinger, P.; Cimalla, Volker; Lebedev, Vadim; Knöbber, F.; Bludau, O.; Röhlig, C.-C.; Baumann, H.
Konferenzbeitrag
2010Residual stress stability in fiber textured stoichiometric AlN film grown using rf magnetron sputtering
Sah, R.E.; Kirste, L.; Baeumler, M.; Hiesinger, P.; Cimalla, V.; Lebedev, V.; Baumann, H.; Zschau, H.-E.
Zeitschriftenaufsatz
2009Stress changes in silicon nitride thin films on thermal cycling and deconvolution of seperate contributions
Sah, R.E.; Baumann, H.
Konferenzbeitrag
2007In-line Bewertung und Optimierung der Coronabehandlung von Polyethylenfolien
Kiesow, A.; Meinhardt, J.; Baumann, H.J.; Heilmann, A.
Konferenzbeitrag
2005Compositional study of silicon oxynitride thin films deposited using electron cyclotron resonance plasma-enhanced chemical vapor deposition technique
Baumann, H.; Sah, R.E.
Zeitschriftenaufsatz
2005High-density ECR-plasma deposited silicon nitride films for applications in III/V-based compound semiconductor devices
Sah, R.E.; Mikulla, M.; Baumann, H.; Benkhelifa, F.; Quay, R.; Weimann, G.
Konferenzbeitrag
2003Silicon nitride films deposited using ECR-PECVD technique for coating InGaAlAs high power laser facets
Sah, R.E.; Rinner, F.; Baumann, H.; Kiefer, R.; Mikulla, M.; Weimann, G.
Zeitschriftenaufsatz
2003Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition
Sundaram, K.B.; Sah, R.E.; Baumann, H.; Balachandran, K.; Todi, R.M.
Zeitschriftenaufsatz
2002DEMS an organischen Elektrolyten
Baumann, H.
Diplomarbeit
2001Thermally induced stress changes in high-density plasma deposited silicon nitride films
Sah, R.E.; Baumann, H.; Mikulla, M.; Kiefer, R.; Weimann, G.
Konferenzbeitrag
2000Novel regioselectively modified 2-and 6- deoxyaminocellulose with N-sulfate, n-carboxymethyl, n- acetyl, and o-sulfate residues, analogous to some related heparin functions
Baumann, H.; Klemm, D.; Richter, A.; Faust, V.
Konferenzbeitrag
1999Effect of aging on stress in silicon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition technique
Sah, R.E.; Baumann, H.; Serries, D.; Kiefer, R.; Braunstein, J.
Konferenzbeitrag
1997Composition and mechanical properties of silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition technique
Sah, R.E.; Baumann, H.; Ohle, T.
Konferenzbeitrag
1997ECR-plasma deposited oxygen-free SiN(x) films for low- and high-reflectivity coatings for GaAs based devices
Sah, R.E.; Weimar, U.; Baumann, H.; Wagner, J.; Kiefer, R.; Müller, S.
Konferenzbeitrag
1996Low-temperature plasma deposition of passivating layers with low hydrogen content for optoelectronic devices
Sah, R.E.; Baumann, H.
Konferenzbeitrag
1995Genetic toxicology of trichloroethylene (TCE)
Fahrig, R.; Madle, S.; Baumann, H.
Zeitschriftenaufsatz
1995Room-temperature, high-deposition-rate, plasma-enhanced chemical vapour deposition of silicon oxynitride thin films producing low surface damage on lattice-matched and pseudomorphic III-V quantum-well structures
Sah, R.E.; Ralston, J.D.; Eichin, G.; Dischler, B.; Rothemund, W.; Wagner, J.; Larkins, E.C.; Baumann, H.
Zeitschriftenaufsatz
1990Amorphous hydrogenated carbon-germanium films for hard multilayer IR optical coatings.
Sah, R.E.; Baumann, H.; Koidl, P.; Wild, C.
Konferenzbeitrag
1987Composition and structure of plasma deposited a-C - H,F films
Fink, J.; Nücker, N.; Sah, R.E.; Baumann, H.; Bethge, K.; Koidl, P.
Konferenzbeitrag
1987Hydrogen release from a-C/H films by MeV irradiation
Baumann, H.; Rupp, T.; Bethge, K.; Koidl, P.; Wild, C.
Konferenzbeitrag