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| 2012 | Insights into electrical characteristics of silicon doped hafnium oxide ferroelectric thin films
Zhou, Dayu; Müller, J.; Xu, Jin; Knebel, S.; Bräuhaus, D.; Schröder, U. | Journal Article |
| 2010 | Reliability of Al2O3-doped ZrO2 high-k dielectrics in three-dimensional stacked metal-insulator-metal capacitors
Zhou, D.; Schroeder, U.; Xu, J.; Weinreich, W.; Heitmann, J.; Jegert, G.; Kerber, M.; Knebel, S.; Erben, E.; Mikolajick, T. | Journal Article |
| 2009 | Detailed correlation of electrical and breakdown characteristics to the structural properties of ALD grown HfO2- and ZrO2-based capacitor dielectrics
Schroeder, U.; Weinreich, W.; Erben, E.; Mueller, J.; Wilde, L.; Heitmann, J.; Agaiby, R.; Zhou, D.; Jegert, G.; Kersch, A. | Conference Paper |
| 2009 | Ferroelectric relaxor behavior and microwave dielectric properties of Ba(Zr0.3Ti0.7)O3 thin films grown by radio frequency magnetron sputtering
Xu, J.; Zhou, D.; Menesklou, W.; Ivers-Tiffee, E. | Journal Article |
| 2009 | Improved manufacturability of ZrO2 MIM capacitors by process stabilizing HfO2 addition
Müller, J.; Böscke, T.S.; Schröder, U.; Reinicke, M.; Oberbeck, L.; Zhou, D.; Weinreich, W.; Kücher, P.; Lemberger, M.; Frey, L. | Conference Paper, Journal Article |
| 2007 | Realizing the potential of energy efficiency
Jochem, E.; Zhou, D.; Bashmakov, I.; Farinelli, U.; Halpeth, M.K. | Book |