Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Optische Anordnung zur spektralen Zerlegung von Licht
Flügel-Paul, Thomas; Harzendorf, Torsten; Michaelis, Dirk; Zeitner, Uwe Detlef
Patent
2016Verfahren und Vorrichtung zur interferometrischen Prüfung
Beier, Matthias; Stumpf, Daniela; Gebhardt, Andreas; Risse, Stefan; Zeitner, Uwe Detlef
Patent
2015Development, fabrication, and testing of an anamorphic imaging snap-together freeform telescope
Beier, Matthias; Hartung, Johannes; Peschel, Thomas; Damm, Christoph; Gebhardt, Andreas; Scheiding, Sebastian; Stumpf, Daniela; Zeitner, Uwe D.; Risse, Stefan; Eberhardt, Ramona; Tünnermann, Andreas
Journal Article
2015Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography
Bourgin, Yannick; Siefke, Thomas; Käsebier, Thomas; Kley, Ernst-Bernhard; Zeitner, Uwe D.
Conference Paper
2015Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography
Bourgin, Yannick; Siefke, Thomas; Käsebier, Thomas; Genevee, Pascal; Szeghalmi, Adriana; Kley, Ernst-Bernhard; Zeitner, Uwe D.
Journal Article
2015Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
Paul, Thomas; Matthes, Andre; Harzendorf, Torsten; Ratzsch, Stephan; Zeitner, Uwe D.
Journal Article
2015High-resolution proximity lithography for nano-optical components
Stürzebecher, Lorenz; Fuchs, Frank; Zeitner, Uwe Detlef; Tünnermann, Andreas
Journal Article
2015Mask Aligner Lithography for TSV-Structures using a Double-Sided (structured) Photomask
Weichelt, Tina; Stuerzebecher, Lorenz; Zeitner, Uwe Detlef
Conference Paper
2015Optimized lithography process for through-silicon vias-fabrication using a double-sided (structured) photomask for mask aligner lithography
Weichelt, Tina; Stürzebecher, Lorenz; Zeitner, Uwe D.
Journal Article
2015Sub-700fs pulses at 152 W average power from a Tm-doped fiber CPA system
Gaida, Christian; Stutzki, Fabian; Gebhardt, Martin; Jansen, Florian; Wienke, Andreas; Zeitner, Uwe D.; Fuchs, Frank; Jauregui, Cesar; Wandt, Dieter; Kracht, Dietmar; Limpert, Jens; Tünnermann, Andreas
Conference Paper
2014250 nm period grating transferred by proximity i-line mask-aligner lithography
Bourgin, Yannick; Käsebier, Thomas; Zeitner, Uwe Detlef
Journal Article
2014Efficient fabrication of complex nano-optical structures by E-beam lithography based on charakter projection
Zeitner, Uwe Detlef; Harzendorf, Torsten; Fuchs, Frank; Banasch, Michael; Schmidt, Holger; Kley, Ernst-Bernhard
Conference Paper
2014Fast character projection electron beam lithography for diffractive optical elements
Harzendorf, Torsten; Fuchs, Frank; Banasch, Michael; Zeitner, Uwe Detlef
Conference Paper
2014High-refractive-index gratings for spectroscopic and laser applications
Zeitner, Uwe Detlef; Fuchs, Frank; Kley, Ernst-Bernhard; Tünnermann, Andreas
Conference Paper
2014Pulse compression grating fabrication by diffractive proximity photolithography
Stürzebecher, Lorenz; Fuchs, Frank; Harzendorf, Torsten; Zeitner, Uwe Detlef
Journal Article
2013Highly efficient broadband blazed grating in resonance domain
Oliva, Maria; Michaelis, Dirk; Fuchs, Frank; Tünnermann, Andreas; Zeitner, Uwe Detlef
Journal Article
2013Mode shaping in semiconductor broad area lasers by monolithically integrated phase structures
Eckstein, Christoph; Zeitner, Uwe D.; Tünnermann, Andreas; Strauss, Uwe; Schmid, Wolfgang; Lauer, Christian
Journal Article
2013Modeling electro-optical characteristics of broad area semiconductor lasers based on a quasi-stationary multimode analysis
Eckstein, Christoph; Zeitner, Uwe D.
Journal Article
2013Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources
Trost, Marcus; Schröder, Sven; Duparré, Angela; Risse, Stefan; Feigl, Torsten; Zeitner, Uwe D.; Tünnermann, Andreas
Journal Article
2012Beugungsgitter und Verfahren zu dessen Herstellung
Fuchs, Frank; Zeitner, Uwe Detlef; Kley, E.-B.
Patent
2012Direct wafer bonding for encapsulation of fused silica optical gratings
Kalkowski, Gerhard; Zeitner, Uwe Detlef; Benkenstein, Tino; Fuchs, J. Hans-Jörg; Rothhardt, Carolin; Eberhardt, Ramona
Journal Article, Conference Paper
2012High numerical aperture hybrid optics for two-photon polymerization
Burmeister, Frank; Zeitner, Uwe D.; Nolte, Stefan; Tünnermann, Andreas
Journal Article
2012High performance dielectric diffraction gratings for space applications
Zeitner, Uwe D.; Fuchs, Frank; Kley, Ernst-Bernhard
Conference Paper
2012High performance diffraction gratings made by e-beam lithography
Zeitner, Uwe D.; Oliva, Maria; Fuchs, Frank; Michaelis, Dirk; Benkenstein, Tino; Harzendorf, Torsten; Kley, Ernst-Bernhard
Journal Article
2012Hybrid optics for three-dimensional microstructuring of polymers via direct laser writing
Burmeister, Frank; Zeitner, Uwe D.; Nolte, Stefan; Tünnermann, Andreas
Conference Paper
2012Materials and technologies for fabrication of three-dimensional microstructures with sub-100 nm feature sizes by two-photon polymerization
Burmeister, Frank; Steenhusen, Sönke; Houbertz, Ruth; Zeitner, Uwe Detlef; Nolte, Stefan; Tünnermann, Andreas
Journal Article
2012Novel gap alignment sensor for high-resolution proximity lithography
Harzendorf, Torsten; Stürzebecher, Lorenz; Zeitner, Uwe Detlef
Conference Paper
2012Reflexionsbeugungsgitter und Verfahren zu dessen Herstellung
Fuchs, Frank; Zeitner, Uwe Detlef
Patent
2012Sub-micrometer pattern generation by diffractive mask-aligner lithography
Zeitner, Uwe D.; Stuerzebecher, Lorenz; Harzendorf, Torsten; Fuchs, Frank; Michaelis, Dirk
Conference Paper
2012Twyman-Green-type integrated laser interferometer array for parallel MEMS testing
Oliva, Maria; Michaelis, Dirk; Dannberg, Peter; Józwik, Michal; Lizewski, Kamil; Kujawiñska, Malgorzata; Zeitner, Uwe Detlef
Journal Article
2012Waveguide grating radial polarizer for the photolithography of circularly symmetrical optical elements
Jourlin, Yves; Tonchev, Svetlen; Parriaux, Olivier; Sauvage-Vincent, Jean; Harzendorf, Torsten; Zeitner, Uwe D.
Journal Article